To produce high-yielding wafers, overlay control in DRAM production needs to be exceptionally tight. The ASML YieldStar 375F introduces a continuous wavelength source and dual wavelength operation to deliver the high measurement accuracy and robustness required as input to the overlay control loop. At the same time, the high throughput required to allow high sampling densities is maintained. The YieldStar 375 was evaluated and adopted for Samsung’s D1y DRAM node.
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