CONFERENCE PROCEEDINGS
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Jaesun Woo
at SK Hynix Inc
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Author
Publications (3)
Proceedings Article | 20 March 2020 Paper
OPO residuals reduction with imaging metrology color per layer mode
Shlomit Katz, Honggoo Lee, Dongyoung Lee, Jinsoo Kim, Jaesun Woo, Chunsoo Kang, Chanha Park, Dohwa Lee, Seongjae Lee, Sanghuck Jeon, Dongsub Choi, Anna Golotsvan, Roie Volkivich, Efi Megged
Proceedings Volume 11325, 113252E (2020) https://doi.org/10.1117/12.2541933
KEYWORDS: Metrology, Overlay metrology, Optical filters, Optical parametric oscillators, 3D metrology, Semiconducting wafers, Near infrared, Photoresist materials, Imaging metrology, Wafer-level optics
Proceedings Article | 28 March 2017 Paper
Monitoring of multi-patterning processes in production environment
Sangjun Han, Honggoo Lee, Jaesun Woo, Seungyoung Kim, Wan-Soo Kim, Stefan Buhl, Boris Habets, Seop Kim
Proceedings Volume 10145, 101452M (2017) https://doi.org/10.1117/12.2257978
KEYWORDS: Critical dimension metrology, Optical lithography, Lithography, Environmental monitoring, Semiconducting wafers, Semiconductors, Etching, Photomasks, Image processing, Metrology
Proceedings Article | 24 March 2017 Paper
Experimental verification of on-product overlay improvement by intra-lot overlay control using metrology based grouping
Honggoo Lee, Junghwan Moon, Jaesun Woo, Sangjun Han, Changrock Song, Marc Hauptmann, Weitian Kou, Alexander Ypma, Hyun-Woo Yu, Hank Han, Michiel Kupers, Paul Böcker, Daan Slotboom
Proceedings Volume 10147, 1014713 (2017) https://doi.org/10.1117/12.2259846
KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Optical lithography, Scanners, Optical alignment, Near infrared, Polishing
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