Mr. Jeffrey R. Strahan Profile

Jeffrey R. Strahan

Graduate Student at Univ of Texas at Austin

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 31 March 2010 Paper

Extension of 248 nm Monte Carlo, mesoscale models to 193 nm platforms

Michael Carcasi, Mark Somervell, Steven Scheer, Siddharth Chauhan, Jeffrey Strahan, C. Willson

Proceedings Volume 7639, 76392K (2010) https://doi.org/10.1117/12.846658

KEYWORDS: Systems modeling, Line edge roughness, Polymers, Diffusion, Calibration, Data modeling, Monte Carlo methods, Lithography, Molecular interactions, Stochastic processes

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SPIE Journal Paper | 1 October 2009

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists

Jeffrey Strahan, Jacob Adams, Kane Jen, Anja Vanleenhove, Colin Neikirk, Timothy Rochelle, Roel Gronheid, Carlton Willson

JM3, Vol. 8, Issue 04, 043011, (October 2009) https://doi.org/10.1117/12.10.1117/1.3274005

KEYWORDS: Polymers, Extreme ultraviolet, Polymethylmethacrylate, Electron beam lithography, Fluorine, Magnesium, Photomasks, Liquids, Chemistry, Lithography

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Proceedings Article | 1 April 2009 Paper

Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

Jeff Strahan, Jacob Adams, Wei-Lun Jen, Anja Vanleenhove, Colin Neikirk, Timothy Rochelle, Roel Gronheid, C. Grant Willson

Proceedings Volume 7273, 72733G (2009) https://doi.org/10.1117/12.813736

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Data modeling, Lithography, Diagnostics, Nanoimprint lithography, Photoresist processing, Diffusion, Reticles

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Proceedings Article | 1 April 2009 Paper

EUV resist requirements: absorbance and acid yield

Roel Gronheid, Carlos Fonseca, Michael Leeson, Jacob Adams, Jeffrey Strahan, C. Grant Willson, Bruce Smith

Proceedings Volume 7273, 727332 (2009) https://doi.org/10.1117/12.814716

KEYWORDS: Absorbance, Extreme ultraviolet, Polymethylmethacrylate, Line width roughness, Extreme ultraviolet lithography, Photons, Polymers, Quantum efficiency, Lithography, Molecules

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