Dr. Jens Schneider Profile

Dr. Jens Schneider

Principal Lithography

SPIE Involvement:

Author

Area of Expertise:

Lithography , Litho Process Development , Litho Materials , Innovation Topics

Publications (12)

Proceedings Article | 19 September 2018 Paper

Revival of grayscale technique in power semiconductor processing under low-cost manufacturing constraints

Jens Schneider, Dieter Kaiser, Nicolo Morgana, Marcel Heller, Henning Feick

Proceedings Volume 10775, 107750W (2018) https://doi.org/10.1117/12.2326006

KEYWORDS: Photomasks, Photoresist processing, Grayscale lithography, Lithography, Semiconductor manufacturing, Manufacturing, Ions, Semiconducting wafers, Doping, Ion implantation

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Proceedings Article | 28 March 2014 Paper

Litho resist rework influences on Cu metal layer patterning with TiN-hard mask

Marcus Dankelmann, Markus Czekalla, Heiko Estel, Jens Hahn, Bee Kim Hong, Mario Lamm, Eric Neubert, Michael Renner, Rainer Scheibel, Maik Stegemann, Jens Schneider

Proceedings Volume 9054, 90540P (2014) https://doi.org/10.1117/12.2045307

KEYWORDS: Etching, Oxygen, Photoresist processing, Semiconducting wafers, Photomasks, Metals, Plasma, Tin, Critical dimension metrology, Chemistry

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Proceedings Article | 12 April 2013 Paper

Grayscale lithography: 3D structuring and thickness control

Marcel Heller, Dieter Kaiser, Maik Stegemann, Georg Holfeld, Nicoló Morgana, Jens Schneider, Daniel Sarlette

Proceedings Volume 8683, 868310 (2013) https://doi.org/10.1117/12.2008847

KEYWORDS: Etching, Oxides, Photoresist materials, Photomasks, Semiconducting wafers, Reactive ion etching, Grayscale lithography, Lithography, Ions, Atomic force microscopy

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Proceedings Article | 29 March 2013 Paper

3D lithography for implant applications

Jens Schneider, Henning Feick, Dieter Kaiser, Marcel Heller, Daniel Sarlette

Proceedings Volume 8683, 86831P (2013) https://doi.org/10.1117/12.2008444

KEYWORDS: Photomasks, Grayscale lithography, Lithography, Doping, Silicon, Ion implantation, Photoresist processing, Ions, Semiconducting wafers, Optical lithography

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Proceedings Article | 20 April 2011 Paper

Influence of BARC filtration and materials on the reduction of spire defects

Jens Schneider, Susanne Volkland, Ulrike Feldner, Lincoln O'Riain, Dirk Peters, Felix Braun, Lothar Brencher, Barbara Hornig, Oliver Luxenhofer, Daniel Sarlette

Proceedings Volume 7971, 797128 (2011) https://doi.org/10.1117/12.879431

KEYWORDS: Etching, Contamination, Metals, Lithography, Reliability, Dielectric filters, Semiconducting wafers, Particles, Bottom antireflective coatings, Dielectrics

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Proceedings Article | 23 March 2011 Paper

Source and mask optimization applications in manufacturing

ChinTeong Lim, Vlad Temchenko, Ulrich Klostermann, Vitaliy Domnenko, Jens Schneider, Daniel Sarlette, Ingo Meusel, Dieter Kaiser, Ralf Ploss

Proceedings Volume 7973, 797322 (2011) https://doi.org/10.1117/12.879203

KEYWORDS: Optical proximity correction, Source mask optimization, Scanners, Lithography, Photomasks, Manufacturing, Photovoltaics, Fiber optic illuminators, Reticles, Resolution enhancement technologies

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Proceedings Article | 4 March 2010 Paper

Methods and challenges to extend existing dry 193nm medium NA lithography beyond 90nm

Jens Schneider, Andreas Greiner, ChinTeong Lim, Vlad Temchenko, Felix Braun, Dieter Kaiser, Tarja Hauck, Ingo Meusel, Dietrich Burmeister, Stephan Loehr, Susanne Volkland, Astrid Bauch, Hendrik Kirbach, Daniel Sarlette, Katrin Thiede

Proceedings Volume 7640, 76403G (2010) https://doi.org/10.1117/12.848207

KEYWORDS: Resolution enhancement technologies, Lithography, Optical proximity correction, Semiconducting wafers, Image processing, 193nm lithography, Chemical reactions, Scanners, Etching, Design for manufacturing

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Proceedings Article | 16 March 2009 Paper

Manufacturability of ILT patterns in low-NA 193nm environment

ChinTeong Lim, Vlad Temchenko, Ingo Meusel, Dieter Kaiser, Jens Schneider, Martin Niehoff

Proceedings Volume 7274, 727439 (2009) https://doi.org/10.1117/12.814144

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Resolution enhancement technologies, Manufacturing, Lithographic illumination, Semiconducting wafers, Logic, 193nm lithography, Silicon

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Proceedings Article | 1 April 2008 Paper

Coupled-dipole modelling for 3D mask simulation

Vlad Temchenko, Chinteong Lim, Dave Wallis, Jens Schneider, Martin Niehoff

Proceedings Volume 6924, 69240W (2008) https://doi.org/10.1117/12.772572

KEYWORDS: Photomasks, Finite-difference time-domain method, Near field, Optical proximity correction, Polarization, Interfaces, 3D modeling, Lithography, Computer simulations, Semiconducting wafers

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Proceedings Article | 7 March 2008 Paper

Consideration of VT5 etch-based OPC modeling

ChinTeong Lim, Vlad Temchenko, Dieter Kaiser, Ingo Meusel, Sebastian Schmidt, Jens Schneider, Martin Niehoff

Proceedings Volume 6924, 69243D (2008) https://doi.org/10.1117/12.772585

KEYWORDS: Etching, Optical proximity correction, Data modeling, Process modeling, Calibration, Optics manufacturing, Critical dimension metrology, Lithography, Photoresist processing, Design for manufacturing

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Proceedings Article | 28 May 2003 Paper

Compensation of long-range process effects on photomasks by design data correction

Martin Bloecker, Gerd Ballhorn, Jens Schneider, Nikola Belic, Hans Eisenmann, Danny Keogan

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515122

KEYWORDS: Critical dimension metrology, Etching, Photomasks, Data corrections, Data modeling, Dry etching, Convolution, Chromium, Plasma etching, Chlorine

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Proceedings Article | 27 December 2002 Paper

Compensation of long-range process effects on photomasks by design data correction

Jens Schneider, Martin Bloecker, Gerd Ballhorn, Nikola Belic, Hans Eisenmann, Danny Keogan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467572

KEYWORDS: Critical dimension metrology, Etching, Data corrections, Photomasks, Dry etching, Data modeling, Convolution, Plasma etching, Chromium, Computed tomography

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Showing 5 of 12 publications

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