Dr. Ji Xu Profile

Dr. Ji Xu

Data Scientist at Motivo, Inc

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 3 April 2017 Presentation + Paper

Optimization of complex high-dimensional layout configurations for IC physical designs using graph search, data analytics, and machine learning

Vito Dai, Edward Kah Ching Teoh, Ji Xu, Bharath Rangarajan

Proceedings Volume 10148, 1014808 (2017) https://doi.org/10.1117/12.2262146

KEYWORDS: Pattern recognition, Yield improvement, Computational lithography, Databases, Manufacturing, Integrated circuit design, Machine learning, Analytics, Integrated circuits, Design for manufacturability, Optical proximity correction, Product engineering, Lithography, Statistical analysis, Metrology, Computer simulations

Read Abstract +

Proceedings Article | 26 March 2015 Paper

Design layout analysis and DFM optimization using topological patterns

Ji Xu, Karthik Krishnamoorthy, Edward Teoh, Vito Dai, Luigi Capodieci, Jason Sweis, Ya-Chieh Lai

Proceedings Volume 9427, 94270Q (2015) https://doi.org/10.1117/12.2086904

KEYWORDS: Manufacturing, Metals, Design for manufacturing, Raster graphics, Image classification, Data modeling, Statistical analysis, Design for manufacturability, Current controlled current source, Optimization (mathematics)

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Improving SEM image quality using pixel super resolution technique

Myungjun Lee, Jason Cantone, Ji Xu, Lei Sun, Ryoung-han Kim

Proceedings Volume 9050, 90500U (2014) https://doi.org/10.1117/12.2046426

KEYWORDS: Lawrencium, Scanning electron microscopy, Image resolution, Image quality, Distortion, Super resolution, Semiconducting wafers, Image processing, Metrology, Image enhancement

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond

Nihar Mohanty, Akiteru Ko, Christopher Cole, Vinayak Rastogi, Kaushik Kumar, Gerard Schmid, Richard Farrell, Todd Ryan, Erik Hosler, Ji Xu, Moshe Preil

Proceedings Volume 9054, 90540R (2014) https://doi.org/10.1117/12.2048320

KEYWORDS: Etching, Optical lithography, Plasma, Semiconducting wafers, Double patterning technology, Lithography, Photons, Back end of line, Metals, Directed self assembly

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends

Azat Latypov, Tamer Coskun, Grant Garner, Moshe Preil, Gerard Schmid, Ji Xu, Yi Zou

Proceedings Volume 9049, 904908 (2014) https://doi.org/10.1117/12.2046082

KEYWORDS: Monte Carlo methods, Atrial fibrillation, Etching, Optical lithography, Polymers, Molecules, Polymethylmethacrylate, Roentgenium, Computer simulations, Directed self assembly

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Manufacturability considerations for DSA

Richard Farrell, Erik Hosler, Gerard Schmid, Ji Xu, Moshe Preil, Vinayak Rastogi, Nihar Mohanty, Kaushik Kumar, Michael Cicoria, David Hetzer, Anton DeVilliers

Proceedings Volume 9051, 90510Z (2014) https://doi.org/10.1117/12.2048396

KEYWORDS: Polymethylmethacrylate, Optical lithography, Photoresist materials, Line edge roughness, Etching, Line width roughness, Picosecond phenomena, Scanning electron microscopy, Annealing, Directed self assembly

Read Abstract +

Proceedings Article | 26 March 2013 Paper

Fabrication of 28nm pitch Si fins with DSA lithography

Gerard Schmid, Richard Farrell, Ji Xu, Chanro Park, Moshe Preil, Vidhya Chakrapani, Nihar Mohanty, Akiteru Ko, Michael Cicoria, David Hetzer, Mark Somervell, Benjamen Rathsack

Proceedings Volume 8680, 86801F (2013) https://doi.org/10.1117/12.2011607

KEYWORDS: Optical lithography, Etching, Silicon, Photoresist materials, Finite element methods, Picosecond phenomena, Coating, Polymethylmethacrylate, Lithography, Directed self assembly

Read Abstract +

Proceedings Article | 26 March 2013 Paper

Exploration of the directed self-assembly based nano-fabrication design space using computational simulations

Azat Latypov, Moshe Preil, Gerard Schmid, Ji Xu, He Yi, Kenji Yoshimoto, Yi Zou

Proceedings Volume 8680, 868013 (2013) https://doi.org/10.1117/12.2011238

KEYWORDS: Monte Carlo methods, Optical proximity correction, Computer simulations, Polymers, Annealing, Polymethylmethacrylate, Deep ultraviolet, Integrated circuits, Nanofabrication, Directed self assembly

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years