A chemical and biological sensor based on a free-space waveguide resonant grating optical filter has been developed. Different from the conventional surface plasmon resonance sensors and the conventional waveguide mode sensors, which require either prism coupling or grating coupling, the proposed free-space optical sensor device does not require special separate coupling. The inherent 100% coupling efficiency at resonance can significantly boost probe efficiency. Both simulation and experimental results have demonstrated that the new sensor could deliver a resolution of better than 0.001 to 0.0001 for refractive index sensing, which is enough for detecting various chemical and biological materials. More importantly, under an angular detection scheme, the proposed waveguide resonant grating sensor could be one order's more sensitive than the conventional surface plasmon resonance sensor.
Our focus is on the potential of enhancing light-matter interactions by using microstructures. It has been proven that
microstructures of composite materials (MCMs) are versatile means for passive optical functional integration. Here we
elaborate on some motivations and preliminary results. By using MCMs, we present a few examples of enhanced
functional integration for optical networks and structures for light trapping at UV-VIS (e.g., solar cells). Simulations of
wavelength division multiplexing (WDM) and polarization dependent devices for network terminals at 1310 nm and
1500nm are presented. A simple principle was used to demonstrate total absorption of visible spectrum around 400-500
nm, which may benefit application such as solar cells.
We design and fabricate polarization-dependent components (PDCs) based on all-dielectric, fully planarized,
multilayer microstructures of 150 nm period by using low-loss materials. Quarter-wave and half-wave phase
plates at 405 nm are presented. Wafer-level retardation within +/-7deg of the targets and wavefront distortion at
10mm-aperture <20mλ rms are achieved. We also discussed the reliability of various composite microstructures.
Stress-test up to 2000 hours at 85°C and 85% relative humidity confirmed that even air-channeled microstructures
surpass very stringent reliability requirements. Multifunction integrated diffractive PDCs are discussed.
We report optical devices based on monolithic integration of multiple nano-structured optical functional layers. Ultraviolet (UV)-nanoimprint lithography along with thin-film deposition, high aspect-ratio reactive ion etching (RIE) and trench-filling technologies were used in fabrication and integration of individual nano-structured optical functional layers. Structures with sub-50 nm linewidth were required in order to achieve good optical performance in the near-UV and visible wavelengths. The ability to integrate multiple nanostructure-based optical layers opens a path for novel integrated optical devices, as well as a new strategy for driving both miniaturization and cost.
We investigate a viable manufacture method of large area transmission only polarizers (TOPOL). A multilayer, mixed-scale (nanostructures and microstructrures) design is presented to accomplish the required functional integration. The effective domain of the device is less than 2 μm in thickness. Nanoimprint and UV lithography is combined to demonstrate the viable fabrication processes with 100 mm diameter wafers. The proposed structures can be further integrated. We also present detailed comparisons of the integrated devices with high-performance commercial-grade bulk optics.
Based on mechanical replication, nanoimprint lithography is an emerging technology that can achieve lithographic resolutions beyond the limitations set by light diffractions or beam scatterings in conventional lithographic techniques, while promising high-throughput patterning. This tutorial paper reviews the status and some of the recent progress in the commercial applications of this technology.
We design broadband polarization mirrors for optical communications. The mirrors consist of multilayer subwavelength gratings that do not require lateral alignment with respect to one another. Flexible bandwidth control and wide angular response of reflectivity are demonstrated in several configurations with 2, 3, and 4 layers of gratings. Perspective applications to the polarization control of active devices in the telecommunication windows, including vertical cavity surface emitting lasers are presented.
Aluminum nanowire-grid polarizers and polarizing beam splitters with a fixed pitch (i.e., period) of ~146 nm but a wide range of linewidths (from < 60 nm to 90 nm) and heights (from 150 nm to 200 nm) are studied. Immersion interference lithography, UV-nanoimprint lithography and aluminum reactive ion etching were used to fabricate the nanowire-grid polarizers. Optical performance of the nanowire-grid polarizers was characterized in a broad spectral range from UV (< 400 nm) to near infrared (> 1700 nm). The performance trade-off between transmittance/reflectance and extinction ratio is investigated in details. The developed high-performance large-area broadband nanowire-grid polarizer opens the potential for many optical applications particularly integrated optics.
Nano-optic retarders and polarizers based on dielectric and metal nano-gratings were fabricated by UV-nanoimprint lithography. Different from conventional nanostructure-based optical devices, atomic layer deposition, a highly uniform and conformal deposition process, were utilized to fill trenches of the both dielectric and metal nano-gratings. The resulted immersion nano-grating design opens a path for innovative nano-grating based optical devices and integrated optical devices. As an example, a high-performance fully-buried aluminum nanowire-gird polarizer was developed which allowed us to achieve a monolithically integrated visible circular polarizer. The ability to integrate multiple nanostructure-based optical layers opens a path for innovative integrated optical devices as well as a new strategy for driving both miniature and cost.
We developed a nano-manufacturing platform based on wafer level nano-replication with mold and nano-pattern transfer by nano-lithography. The nano-replication process, which based on imprinting a single-layer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Nano-optic devices, such as, quarter wave plates and polarizers, were manufactured with the nano-manufacturing platform. Excellent wafer level performance and yield were achieved. The developed technology is suitable for high-throughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.
We developed various optical devices and integrated optical devices based on innovative nano-optical structures and design. The nano-optical devices and integrated devices were fabricated through a nano-manufacturing platform based on wafer level nano-replication with mold and nano-pattern transfer by nano-lithography. The nano-replication process, which based on imprinting a single-layer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Excellent wafer level performance and yield were achieved. Nano-optic devices, such as, quarter wave plates and polarizers, and integrated nano-optical devices, such as monolithically integrated semi-isolators, were manufactured with the nano-manufacturing platform. The developed technology is suitable for high-throughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.
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