Dr. Jia-Rui Hu Profile

Dr. Jia-Rui Hu

Technical Manager at TSMC

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Author

Publications (4)

Proceedings Article | 8 March 2016 Paper

Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface, and control loop

Jiarui Hu, Y. L. Chen, K. H. Chen, Brian Lee, Frankie Tsai, C. M. Ke, C. H. Liao, Desmond Ngo, Benny Gosali, Robin Tijssen, Vincent Huang, Ward Tu, Marc Noot, Maryana Escalante Marun, Christian Leewis, Carlo Luijten, Frank Staals, Martijn Van Veen, Francois Furthner, Stuart Young, Kaustuve Bhattacharyya

Proceedings Volume 9778, 977829 (2016) https://doi.org/10.1117/12.2220373

KEYWORDS: Metrology, Calibration, Scanners, Process control, Interfaces, Optical lithography, Semiconducting wafers, Photoresist materials, Finite element methods, Inspection, Data modeling, Diffraction

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Proceedings Article | 8 March 2016 Paper

A novel method to quantify the complex mask patterns

Yu-Lung Tung, Che-Yuan Sun, Shu-Chuan Chuang, Woei-Bin Luo, Jia-Rui Hu, Hsiang-Lin Chen, Hua-Tai Lin, Chih-Ming Ke, Tsai-Sheng Gau

Proceedings Volume 9778, 97783S (2016) https://doi.org/10.1117/12.2218346

KEYWORDS: Photomasks, Optical lithography, Critical dimension metrology, Optical proximity correction, Image processing, Process control, 193nm lithography, Lithography, Semiconductors, Performance modeling, Electron beam lithography, Mask making, Metrology

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Proceedings Article | 10 April 2013 Paper

Defect window analysis by using SEM-contour based shape quantifying method for sub-20nm node production

Daisuke Hibino, Mingyi Hsu, Hiroyuki Shindo, Masayuki Izawa, Yuji Enomoto, J. Lin, J. R. Hu

Proceedings Volume 8681, 86810B (2013) https://doi.org/10.1117/12.2010780

KEYWORDS: Optical proximity correction, Inspection, Critical dimension metrology, Scanning electron microscopy, Photomasks, Semiconducting wafers, Shape analysis, Yield improvement, Feature extraction, Finite element methods

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Proceedings Article | 2 April 2010 Paper

Detection of lateral CD shift with scatterometry on grating structures in production layout

Jacky Huang, Jiarui Hu, Willie Wang, Ya-Ping Lee, Chih-Ming Ke, Tsai-Sheng Gau

Proceedings Volume 7638, 76381Q (2010) https://doi.org/10.1117/12.848522

KEYWORDS: Overlay metrology, Scatterometry, Reflectivity, Critical dimension metrology, Laser marking, Metrology, Double patterning technology, Analytical research, Optical alignment, Semiconducting wafers

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