Dr. Jing Xue Profile

Dr. Jing Xue

Student

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 13 June 2022 Presentation

Feasibility study of machine learning modeling for full chip optical proximity correction

Yuping Cui, Jing Xue, Jing Sha, Zheng Guo Chen, Larry Zhuang, Derren Dunn, Jeffrery Shearer, Li-Jin Chen, Rich Wu, Charlie King

Proceedings Volume 12052, 120520R (2022) https://doi.org/10.1117/12.2614060

KEYWORDS: Optical proximity correction, Machine learning, Data modeling, Neural networks, Process modeling, Photomasks, Wafer-level optics, Semiconducting wafers, Lithography, Photoresist processing

Read Abstract +

Proceedings Article | 17 April 2020 Presentation + Paper

Dual tone sub-resolution assist features to improve corner rounding

Cheng Chi, Hao Tang, Oseo Park, Jing Xue, Jing Guo, Geng Han, Charlie King, Jeff Shearer, Sean Burns

Proceedings Volume 11327, 113270E (2020) https://doi.org/10.1117/12.2550834

KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Data modeling, Yield improvement, Optics manufacturing, Optical lithography, Deep ultraviolet, Logic

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Binary modeling method to check the sub-resolution assist features (SRAFs) printability

Jianliang Li, Weimin Gao, Yongfa Fan, Jing Xue, Qiliang Yan, Kevin Lucas, Peter De Bisschop, Lawrence Melvin

Proceedings Volume 8326, 83261D (2012) https://doi.org/10.1117/12.916466

KEYWORDS: SRAF, Semiconducting wafers, Binary data, Printing, Optical proximity correction, Calibration, Photomasks, Scanning electron microscopy, Cadmium, Optical lithography

Read Abstract +

Proceedings Article | 29 September 2010 Paper

Integrated mask and optics simulations for mask corner rounding effect in OPC modeling

Jing Xue, Zhijie Deng, Kyoil Koo, James Shiely, Sooryong Lee, Yunqiang Zhang, Yongfa Fan, Thomas Schmoeller

Proceedings Volume 7823, 782341 (2010) https://doi.org/10.1117/12.866197

KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Integrated optics, Calibration, Semiconducting wafers, Optical simulations, Process control, Control systems, Scanning electron microscopy

Read Abstract +

Proceedings Article | 4 March 2010 Paper

A new etch-aware after development inspection (ADI) technique for OPC modeling

Jing Xue, Jason Huang, Aram Kazarian, Brad Falch

Proceedings Volume 7640, 76402Q (2010) https://doi.org/10.1117/12.846683

KEYWORDS: Etching, Data modeling, Lithography, Optical proximity correction, Calibration, Inspection, Performance modeling, Optical lithography, Semiconducting wafers, Process modeling

Read Abstract +

Proceedings Article | 24 March 2008 Paper

Probe-pattern grating focus monitor through scatterometry calibration

Jing Xue, Costas Spanos, Andrew Neureuther

Proceedings Volume 6922, 692225 (2008) https://doi.org/10.1117/12.773191

KEYWORDS: Scatterometry, Calibration, Scatter measurement, Interferometers, Critical dimension metrology, Phase shifts, Spherical lenses, Fourier transforms, Sensors, Semiconducting wafers

Read Abstract +

Proceedings Article | 4 March 2008 Paper

Using composite gratings for optical system characterization through scatterometry

Yu Ben, Jing Xue, Costas Spanos

Proceedings Volume 6925, 69251B (2008) https://doi.org/10.1117/12.772785

KEYWORDS: Scatterometry, Optical design, Pellicles, Lithography, Metrology, Binary data, Spatial frequencies, Composites, Phase shifts, Optical simulations

Read Abstract +

Proceedings Article | 1 November 2007 Paper

Parameter sensitive patterns for scatterometry monitoring

Jing Xue, Yu Ben, Chaohao Wang, Marshal Miller, Costas Spanos, Andrew Neureuther

Proceedings Volume 6730, 67304S (2007) https://doi.org/10.1117/12.746833

KEYWORDS: Scatterometry, Calibration, Critical dimension metrology, Data modeling, Scatter measurement, Semiconducting wafers, Metrology, Phase shifts, Finite element methods, Panoramic photography

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Integrated aerial image sensor (AIS): modeling and assembly

Jing Xue, Kurt Moen, Costas Spanos

Proceedings Volume 6152, 615221 (2006) https://doi.org/10.1117/12.656976

KEYWORDS: Image sensors, Sensors, Semiconducting wafers, Photomasks, Signal to noise ratio, Charge-coupled devices, Capillaries, Optical alignment, Receptors, Lithography

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Design of an integrated aerial image sensor

Jing Xue, Costas Spanos

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600284

KEYWORDS: Sensors, Image sensors, Photomasks, Metrology, Semiconducting wafers, Spatial frequencies, Image transmission, Spatial resolution, Immersion lithography, Lithography

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years