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Jiyou Guo
Sr. Litho Process Engineer at Intel Corp
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Publications (1)
Proceedings Article | 5 July 2000 Paper
Improving image control by correcting the lens-heating focus drift
Bwo-Jung Cheng, Hsiang-Chung Liu, Yuanting Cui, Jiyou Guo
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389075
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Fourier transforms, Charge-coupled devices, Image sensors, Control systems, Printing, Data centers, Wafer-level optics
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