Dr. John M. Hutchinson Profile

Dr. John M. Hutchinson

Staff Process Engineer at Aurrion

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 27 February 2014 Paper

Paper

Heterogeneously integrated lasers on silicon

Brian Koch, Erik Norberg, Jonathan Roth, Byungchae Kim, Anand Ramaswamy, Robert Guzzon, John Hutchinson, Jae-Hyuk Shin, Jeffrey Imamura, Brandon Gomez, Gregory Fish, Alexander Fang

Proceedings Volume 9002, 90020U (2014) https://doi.org/10.1117/12.2042023

KEYWORDS: Modulators, Silicon, Silicon photonics, Photonic integrated circuits, Photodetectors, Semiconducting wafers, Data communications, Semiconductor lasers, Tunable lasers, Laser stabilization

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Proceedings Article | 25 March 2005 Paper

Paper

Device physics of an optoelectronic integrated wavelength converter

Joachim Piprek, V. Lal, John Hutchinson, Jeff Henness, Anna Tauke-Pedretti, Matthew Dummer, Larry Coldren

Proceedings Volume 5729, (2005) https://doi.org/10.1117/12.584570

KEYWORDS: 3D modeling, Quantum wells, Instrument modeling, Optoelectronics, Waveguides, 3D metrology, Absorption, Optoelectronic devices, Physics, Device simulation

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Proceedings Article | 20 December 2004 Paper

Paper

Saturation analysis of a monolithic wavelength converter

Joachim Piprek, John Hutchinson, Jeffrey Henness, Milan Masanovic, Larry Coldren

Proceedings Volume 5594, (2004) https://doi.org/10.1117/12.569180

KEYWORDS: Quantum wells, 3D modeling, Sensors, Optical amplifiers, Absorption, Waveguides, Wavelet packet decomposition, Gallium, Semiconductor optical amplifiers, Photodetectors

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Proceedings Article | 18 June 2004 Paper

Paper

Monolithically integrated InP-based tunable wavelength conversion

John Hutchinson, Jonathon Barton, Milan Masanovic, Matthew Sysak, Jeffrey Henness, Leif Johansson, Daniel Blumenthal, Larry Coldren

Proceedings Volume 5349, (2004) https://doi.org/10.1117/12.537774

KEYWORDS: Modulation, Tunable lasers, Photodiodes, Receivers, Waveguides, Modulators, Transmitters, Mirrors, Quantum wells, Analog electronics

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Proceedings Article | 18 June 2004 Paper

Paper

3D simulation of an integrated wavelength converter

Joachim Piprek, Nicolas Trenado, John Hutchinson, Jeffrey Henness, Larry Coldren

Proceedings Volume 5349, (2004) https://doi.org/10.1117/12.525187

KEYWORDS: Quantum wells, Absorption, Waveguides, Receivers, Optical amplifiers, Quantum efficiency, Optical simulations, Semiconductor lasers, Etching, Integrated optics

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Proceedings Article | 5 July 2000 Paper

Paper

Electrical critical dimension metrology for 100-nm linewidths and below

Andrew Grenville, Brian Coombs, John Hutchinson, Kelin Kuhn, David Miller, Patrick Troccolo

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389034

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Optical lithography, Metrology, Arsenic, Boron, Digital signal processing, Etching, Polishing, Scanning electron microscopy

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Proceedings Article | 5 July 2000 Paper

Paper

Progress in 157-nm lithography development at Intel: resists and reticles

Veena Rao, Eric Panning, Ling Liao, John Hutchinson, Andrew Grenville, Susan Holl, Don Bruner, Raghu Balasubramanian, Ronald Kuse, Giang Dao, Jun-Fei Zheng, Kevin Orvek, Joseph Langston, Fu-Chang Lo

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389005

KEYWORDS: Photomasks, Lithography, Photoresist developing, Reticles, Silica, Optical lithography, Photoresist materials, Chromium, Phase shifts, Absorbance

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Proceedings Article | 29 June 1998 Paper

Paper

Lithographic and chemical contrast of single component top surface imaging (TSI) resists

John Bohland, Janet Chambers, Siddhartha Das, Theodore Fedynyshyn, Susan Holl, John Hutchinson, Veena Rao, Roger Sinta

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312375

KEYWORDS: Lithography, Etching, Image processing, Polymers, Reactive ion etching, Image enhancement, Photoresist processing, Reflection, Oxygen, Line edge roughness

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Proceedings Article | 29 June 1998 Paper

Paper

Progress in 193-nm top-surface imaging process development

John Hutchinson, Veena Rao, Guojing Zhang, Adam Pawloski, Carlos Fonseca, Janet Chambers, Susan Holl, Siddhartha Das, Craig Henderson, David Wheeler

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312405

KEYWORDS: Line edge roughness, Etching, Photoresist processing, Chemically amplified resists, Chemistry, Plasma etching, Silicon, Image processing, Plasma, Optical lithography

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Proceedings Article | 5 June 1998 Paper

Paper

Top-surface imaging resists for EUV lithography

Craig Henderson, David Wheeler, Tim Pollagi, Donna O'Connell, John Goldsmith, Aaron Fisher, Gregory Cardinale, John Hutchinson, Veena Rao

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309590

KEYWORDS: Extreme ultraviolet lithography, Etching, Digital micromirror devices, Line edge roughness, Photomasks, Photoresist processing, Silicon, Extreme ultraviolet, Photoresist materials, Image processing

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Proceedings Article | 5 June 1998 Paper

Paper

Shot-noise impact on resist roughness in EUV lithography

John Hutchinson

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309612

KEYWORDS: Diffusion, Edge roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Photoresist materials, Monte Carlo methods, Line edge roughness, Photon counting, Computer simulations

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Proceedings Article | 14 June 1996 Paper

Paper

TSI process performance in a transformer-coupled plasma dry develop tool

John Hutchinson, Yosias Melaku, Wendy Nguyen, Siddhartha Das

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241838

KEYWORDS: Etching, Plasma, Semiconducting wafers, Oxygen, Photoresist processing, Plasma etching, Interferometers, Photomasks, Ions, Scanning electron microscopy

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Proceedings Article | 9 June 1995 Paper

Paper

Kinetics of chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Juliann Opitz, Dale Hopper, John Hutchinson

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210391

KEYWORDS: Polymers, Photoresist processing, Diffusion, Systems modeling, Catalysis, Chemically amplified resists, Lithography, Ultraviolet radiation, Deep ultraviolet, Chemistry

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Proceedings Article | 9 June 1995 Paper

Paper

Characterization and modeling of a chemically amplified resist for ArF lithography

John Hutchinson, Gregory Wallraff, William Hinsberg, Juliann Opitz, William Oldham

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210397

KEYWORDS: Lithography, Data modeling, Statistical modeling, Photoresist processing, Chemically amplified resists, Photoresist materials, FT-IR spectroscopy, Scanning electron microscopy, Absorption, Excimer lasers

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SPIE Journal Paper | 1 October 1993

Modeling spray/puddle dissolution processes for deep-ultraviolet acid-hardened resists

John Hutchinson, Siddhartha Das, Qi-De Qian, Henry Gaw

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.145968

KEYWORDS: Deep ultraviolet, Data modeling, Signal processing, Semiconducting wafers, Process modeling, Photoresist processing, Picture Archiving and Communication System, Lithography, In situ metrology, Systems modeling

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Proceedings Article | 15 September 1993 Paper

Paper

Evaluation of liquid silylated resists for 213-nm exposure

John Hutchinson, K. Kalpakjian, Robert Schenker, William Oldham

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154777

KEYWORDS: Etching, Liquids, Photoresist processing, Silicon, Lithography, Semiconducting wafers, Diffusion, Reactive ion etching, Plasma, Sputter deposition

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Proceedings Article | 1 June 1992 Paper

Paper

Modeling spray/puddle dissolution processes for DUV acid-hardened resists

John Hutchinson, Siddhartha Das, Qi-De Qian, Henry Gaw

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130337

KEYWORDS: Signal processing, Semiconducting wafers, Data modeling, Process modeling, Picture Archiving and Communication System, Deep ultraviolet, Optical lithography, Lithography, Systems modeling, Statistical modeling

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Showing 5 of 17 publications

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