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Joseph M. Rodriguez
at Intel Corp
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Author
Publications (3)
Proceedings Article | 23 November 2024 Presentation + Paper
Advanced absorber and compensation repair for EUV reticles utilizing a novel e-beam-based repair technique
Joseph Rodriguez, Scott Chegwidden, Andrew Elliott, Lingxuan Peng, Dinumol Devasia, Nathan Wilcox, Safak Sayan, Andrew Ridley, Franz-Josef Eberle, Michael Budach, Chanya Nguyen, Felix Hermanns, Horst Schneider, Klaus Edinger
Proceedings Volume 13216, 132160R (2024) https://doi.org/10.1117/12.3038766
KEYWORDS: Extreme ultraviolet, Reticles, Semiconducting wafers, Photomasks, Wafer level optics, Printing, Optics manufacturing, High volume manufacturing, Scanners, Reflection
Proceedings Article | 13 November 2024 Presentation
Registration correction for EUV photomasks with semi-transparent backside coatings
Scott Chegwidden, Chang Ju Choi, Joseph Rodriguez, Safak Sayan, Avi Cohen, Vladimir Dmitriev
Proceedings Volume 13216, 132161X (2024) https://doi.org/10.1117/12.3038761
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Opacity
Proceedings Article | 2 January 2019 Paper
AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production
Renzo Capelli, Nathan Wilcox, Martin Dietzel, Dirk Hellweg, Scott Chegwidden, Joseph Rodriguez
Proceedings Volume 10810, 108100S (2019) https://doi.org/10.1117/12.2503361
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Extreme ultraviolet lithography, Imaging systems, Semiconducting wafers, Particles, Scanners, Contamination, Manufacturing
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