Karsten Gutjahr
Technical Staff at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 22 February 2021 Presentation + Paper
Cheuk Wun Wong, Neelima Rathi, Taher Kagalwala, Karsten Gutjahr, Patrick Snow, Tony Joung, Tam Vuong, Apollo Marmarinos, Gorby Wan
Proceedings Volume 11611, 1161122 (2021) https://doi.org/10.1117/12.2583733
KEYWORDS: Overlay metrology, Calibration, Signal processing, Optical parametric oscillators, Moire patterns, Metrology, Interference (communication), Target detection, Semiconductor manufacturing, Semiconducting wafers

Proceedings Article | 26 March 2019 Presentation + Paper
Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548
KEYWORDS: Overlay metrology, Scatterometry, Process control

Proceedings Article | 26 March 2019 Paper
Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725
KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

Proceedings Article | 20 March 2018 Presentation + Paper
Nyan Aung, Woong Jae Chung, Pavan Samudrala, Haiyong Gao, Wenle Gao, Darius Brown, Guanchen He, Bono Park, Michael Hsieh, Xueli Hao, Yen-Jen Chen, Yue Zhou, DeNeil Park, Karsten Gutjahr, Ian Krumanocker, Kevin Jock, Juan Manuel Gomez
Proceedings Volume 10587, 105870A (2018) https://doi.org/10.1117/12.2295828
KEYWORDS: Overlay metrology, Semiconducting wafers, Optical alignment, Reticles, High volume manufacturing, Metrology, HVAC controls, Optimization (mathematics), Scanners, Extreme ultraviolet

Proceedings Article | 28 March 2017 Paper
Yue Zhou, DeNeil Park, Karsten Gutjahr, Abhishek Gottipati, Tam Vuong, Sung Yong Bae, Nicholas Stokes, Aiqin Jiang, Po Ya Hsu, Mark O'Mahony, Andrea Donini, Bart Visser, Chris de Ruiter, Grzegorz Grzela, Hans van der Laan, Martin Jak, Pavel Izikson, Stephen Morgan
Proceedings Volume 10145, 101452G (2017) https://doi.org/10.1117/12.2257913
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Environmental sensing, Image processing, Diffraction gratings, Diffraction, Chemical mechanical planarization, Defense and security, Image analysis

Showing 5 of 14 publications
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