Dr. Katsuichi Kitagawa Profile

Dr. Katsuichi Kitagawa

Optical Metrology Specialist

SPIE Involvement:

Author

Area of Expertise:

Optical Interferometry , Machine Vision

Websites:

Company Website | Personal Website

Katsuichi Kitagawa received the B.E. in applied physics in 1964 from the University of Tokyo.

He was an instrument and control engineer with Toray Industries, Inc. from 1964 to 2000.

In 2000 he moved to Toray Engineering Co., Ltd., where he now is a Senior Adviser, Technology.

He earned a Ph.D. in Information Science and Technology from University of Tokyo in 2011.

He is a member of JSPE (the Japan Society for Precision Engineering) and SICE (the Society of Instrument and Control Engineers).

He has received several awards including the SICE Technology Award in 2001, the JSPE Technology Award in 2011, and the Tejima Invention Award in 2004.

He is an Advanced Measurement and Control Engineer (authorized by SICE).

His current research interest is the development and application of optical interferometry.

SPIE Journal Paper | 10 May 2012

Single-shot surface profiling by multiwavelength interferometry without carrier fringe introduction

Katsuichi Kitagawa

JEI, Vol. 21, Issue 2, 021107, (May 2012) https://doi.org/10.1117/12.10.1117/1.JEI.21.2.021107

KEYWORDS: Interferometry, Profiling, Error analysis, Data modeling, Spatial resolution, Computer simulations, Fringe analysis, Modulation, Cameras, Excel

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Proceedings Article | 12 July 2011 Paper

Multiwavelength single-shot interferometry without carrier fringe introduction

Katsuichi Kitagawa

Proceedings Volume 8000, 800009 (2011) https://doi.org/10.1117/12.890302

KEYWORDS: Interferometry, Data modeling, Spatial resolution, RGB color model, Computer simulations, Profiling, Cameras, Excel, 3D modeling, Modulation

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Proceedings Article | 10 October 2007 Paper

Thin film thickness profile measurement using an interferometric surface profiler

Katsuichi Kitagawa

Proceedings Volume 6716, 671607 (2007) https://doi.org/10.1117/12.754178

KEYWORDS: Refractive index, Thin films, Algorithm development, Interferometry, Profiling, Oxides, Silicon, Semiconducting wafers, Profilometers, Chemical mechanical planarization

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Proceedings Article | 12 October 2006 Paper

Recent trends in white-light interferometry

Katsuichi Kitagawa

Proceedings Volume 6382, 638201 (2006) https://doi.org/10.1117/12.693634

KEYWORDS: Algorithm development, Interferometry, Thin films, Silicon, Semiconducting wafers, Oxides, Profiling, Chemical mechanical planarization, Algorithms, Detection and tracking algorithms

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Proceedings Article | 12 October 2006 Paper

Simultaneous measurement of film surface topography and thickness variation using white-light interferometry

Katsuichi Kitagawa

Proceedings Volume 6375, 637507 (2006) https://doi.org/10.1117/12.688109

KEYWORDS: Algorithm development, Interferometry, Refractive index, Silicon, Semiconducting wafers, LCDs, Oxides, Optics manufacturing, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 22 December 2003 Paper

Algorithm with optimum noise suppression for surface profiling by white-light interferometry

Akira Hirabayashi, Yoji Nakayama, Hidemitsu Ogawa, Katsuichi Kitagawa

Proceedings Volume 5180, (2003) https://doi.org/10.1117/12.506711

KEYWORDS: Profiling, Interferometry, Statistical analysis, Optical filters, Interference (communication), Electronic filtering, Algorithms, Beam splitters, Interferometers, CCD cameras

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Proceedings Article | 27 December 2001 Paper

Fast surface profiler by white-light interferometry using a new algorithm, the SEST algorithm

Akira Hirabayashi, Hidemitsu Ogawa, Katsuichi Kitagawa

Proceedings Volume 4451, (2001) https://doi.org/10.1117/12.453634

KEYWORDS: Interferometry, Algorithms, Interferometers, Signal processing, Estimation theory, Fourier transforms, Beam splitters, Digital signal processing, Profiling, CCD cameras

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Showing 5 of 7 publications

Conference Committee Involvement (10)

Optical Metrology and Inspection for Industrial Applications V

11 October 2018 | Beijing, China

Optical Metrology and Inspection for Industrial Applications IV

12 October 2016 | Beijing, China

Dimensional Optical Metrology and Inspection for Practical Applications V

20 April 2016 | Baltimore, MD, United States

Dimensional Optical Metrology and Inspection for Practical Applications IV

20 April 2015 | Baltimore, MD, United States

Optical Metrology and Inspection for Industrial Applications III

9 October 2014 | Beijing, China

Showing 5 of 10 Conference Committees

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