Mr. Kazuyuki Hagiwara Profile

Kazuyuki Hagiwara

Senior Engineer at D2S KK

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Publications (7)

Proceedings Article | 13 July 2017 Paper

Simulation-based MDP verification for leading-edge masks

Bo Su, Oleg Syrel, Michael Pomerantsev, Kazuyuki Hagiwara, Ryan Pearman, Leo Pang, Aki Fujimara

Proceedings Volume 10454, 1045409 (2017) https://doi.org/10.1117/12.2280841

KEYWORDS: Photomasks, Computer simulations, Process modeling, Model-based design, Data modeling, Optical proximity correction, Electron beam lithography, Reactive ion etching, Computer aided design, Mask making

Read Abstract +

For IC design starts below the 20nm technology node, the assist features on photomasks shrink well below 60nm and the printed patterns of those features on masks written by VSB eBeam writers start to show a large deviation from the mask designs. Traditional geometry-based fracturing starts to show large errors for those small features. As a result, other mask data preparation (MDP) methods have become available and adopted, such as rule-based Mask Process Correction (MPC), model-based MPC and eventually model-based MDP.

The new MDP methods may place shot edges slightly differently from target to compensate for mask process effects, so that the final patterns on a mask are much closer to the design (which can be viewed as the ideal mask), especially for those assist features. Such an alteration generally produces better masks that are closer to the intended mask design. Traditional XOR-based MDP verification cannot detect problems caused by eBeam effects. Much like model-based OPC verification which became a necessity for OPC a decade ago, we see the same trend in MDP today.

Simulation-based MDP verification solution requires a GPU-accelerated computational geometry engine with simulation capabilities. To have a meaningful simulation-based mask check, a good mask process model is needed. The TrueModel® system is a field tested physical mask model developed by D2S. The GPU-accelerated D2S Computational Design Platform (CDP) is used to run simulation-based mask check, as well as model-based MDP. In addition to simulation-based checks such as mask EPE or dose margin, geometry-based rules are also available to detect quality issues such as slivers or CD splits. Dose margin related hotspots can also be detected by setting a correct detection threshold.

In this paper, we will demonstrate GPU-acceleration for geometry processing, and give examples of mask check results and performance data. GPU-acceleration is necessary to make simulation-based mask MDP verification acceptable.

Proceedings Article | 28 June 2013 Paper

Better numerical model for shape-dependent dose margin correction using model-based mask data preparation

Yasuki Kimura, Takao Kubota, Kenji Kouno, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara

Proceedings Volume 8701, 87010H (2013) https://doi.org/10.1117/12.2028333

KEYWORDS: Photomasks, Data modeling, Model-based design, Process modeling, Critical dimension metrology, Mask making, Computer simulations, Logic, Lithography, Electron beams

Read Abstract +

Proceedings Article | 28 June 2013 Paper

Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM

Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Photomask quality evaluation using lithography simulation and precision SEM image contour data

Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov

Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

Read Abstract +

Proceedings Article | 8 November 2012 Paper

An enhanced measure of mask quality using separated models

Anthony Adamov, Bob Pack, Kazuyuki Hagiwara, Ingo Bork, Jin Choi, Jissong Park, Byung-Gook Kim

Proceedings Volume 8522, 852207 (2012) https://doi.org/10.1117/12.964379

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Monte Carlo methods, Quality measurement, Lithography, Optical proximity correction, Model-based design, Error analysis, Data modeling

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Shape-dependent dose margin correction using model-based mask data preparation

Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8522, 85221I (2012) https://doi.org/10.1117/12.958601

KEYWORDS: Photomasks, Data modeling, Model-based design, Mask making, Logic, Immersion lithography, Electron beams, Vestigial sideband modulation, SRAF, Modulation

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Proceedings Article | 25 September 2010 Paper

Improvement of mask write time for curvilinear assist features at 22nm

Aki Fujimura, Ingo Bork, Taiichi Kiuchi, Tadashi Komagata, Yasutoshi Nakagawa, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 7823, 782307 (2010) https://doi.org/10.1117/12.864094

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Scanning electron microscopy, Vestigial sideband modulation, Printing, Data modeling, Manufacturing, Error analysis, System on a chip

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Showing 5 of 7 publications

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