This paper describes two optical devices based on linear arrays of micro mirrors. The first is a phased array of micro mirrors that can be rotated as well as translated vertically to maintain coherence across the array. We demonstrate experimentally that such micro mirrors are capable of high-diffraction-efficiency, phased-array scanning of laser beams. The second device is a Gires- Tournois interferometer with a micro mirror array that provides tunable phase modulation for the multitude of partially reflected beams within the interferometer. We demonstrate experimentally that the MEMS-GT interferometer can operate as a tunable deinterleaver for dense Wavelength Division Multiplexed fiber optic communication.
Boron-Carbon-Nitrogen thin films were deposited by laser ablation of B4C target under nitrogen ion-beam bombardment. The deposited thin films were set for X-ray photoelectron spectroscopy (XPS) and ellipsometry measurements. The results showed that in the ternary thin films, boron, carbon and nitrogen species were chemically bound to each other instead of simle mixtures. The B-C bonds were broken by the introduced energetic nitrogen ions and, subsequently, C-N and B-N bonds can be formed. The ellipsometry measurement gave the optical band gap of 0.48 eV for the thin films deposited under 50 eV nitrogen ion beam bombardment. According to the analyses, the nitrogen ion beam energy should be lower than 100 eV in most cases.
Carbon nitride thin films were deposited on silicon wafers by pulsed KrF Excimer (wavelength 248 nm, duration 23 ns) ablation of graphite. Different excimer fluences and pressures of the nitrogen atmosphere were used in order to achieve a high nitrogen content in the deposited thin films. In another case, a Kaufmann-type ion source was used to produce a nitrogen ion beam to assist the deposition process. X-ray photoelectron spectroscopes (XPS) were used to identify the binding structure and the content of the nitrogen species in the deposited thin films. The thin films deposited in nitrogen atmosphere had N/C ratio of 0.42, whilst those deposited with assistance of nitrogen ion beam bombardment had N/C equals 0.43. The dependence of the optical parameters of the deposited films, the refractive n and extinction coefficient k, were studied by Ellipsometry.
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