CONFERENCE PROCEEDINGS
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Dr. Kenji Hiruma
Senior Research Scientist at ASET
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Author
Publications (4)
Proceedings Article | 15 March 2007 Paper
Impact of interface treatment with assisted ion beam on Mo-Si multilayer formation for EUVL mask blanks
Proceedings Volume 6517, 651720 (2007) https://doi.org/10.1117/12.711909
KEYWORDS: Extreme ultraviolet, Interfaces, Surface roughness, Reflectivity, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Atomic force microscopy, Silicon, Photomasks
Proceedings Article | 20 October 2006 Paper
Evaluation of bi-layer TaSix absorber on buffer for EUV mask
Koichiro Kanayama, Shinpei Tamura, Yasushi Nishiyama, Masashi Kawashita, Tadashi Matsuo, Akira Tamura, Susumu Nagashige, Kenji Hiruma, Doohoon Goo, Iwao Nishiyama
Proceedings Volume 6349, 63493A (2006) https://doi.org/10.1117/12.686388
KEYWORDS: Extreme ultraviolet, Gallium, Printing, Photomasks, Atomic force microscopy, Reflectivity, Silicon, Etching, Transparency, Inspection
Proceedings Article | 20 October 2006 Paper
Current status of Mo-Si multilayer formation in ASET for low-defect-density mask blanks for EUV lithography
Proceedings Volume 6349, 634937 (2006) https://doi.org/10.1117/12.685819
KEYWORDS: Silicon, Molybdenum, Sputter deposition, Ion beams, Interfaces, Particles, Reflectivity, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography
Proceedings Article | 23 March 2006 Paper
Performance and quality analysis of Mo-Si multilayers deposited by ion beam sputtering and magnetron sputtering
Proceedings Volume 6151, 61511V (2006) https://doi.org/10.1117/12.655563
KEYWORDS: Sputter deposition, Silicon, Molybdenum, Extreme ultraviolet, Interfaces, Ion beams, Reflectivity, Chemical species, Transmission electron microscopy, Argon
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