Mr. Kenji Kawano Profile

Kenji Kawano

at Toshiba

SPIE Involvement:

Author

Publications (12)

SPIE Journal Paper | 1 January 2009

Novel lithography design and verification methodology with patterning failure

Seiro Miyoshi, Yuuji Kobayashi, Satoshi Tanaka, Kenji Kawano, Koji Hashimoto, Soichi Inoue

JM3, Vol. 8, Issue 01, 013004, (January 2009) https://doi.org/10.1117/12.10.1117/1.3079782

KEYWORDS: Data modeling, Line width roughness, Critical dimension metrology, Nanoimprint lithography, Lithography, Process modeling, Optical lithography, Lithographic illumination, Semiconducting wafers, Inspection

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Proceedings Article | 4 December 2008 Paper

A novel lithography design and verification methodology with patterning failure

Seiro Miyoshi, Yuuji Kobayashi, Satoshi Tanaka, Kenji Kawano, Kohji Hashimoto, Soichi Inoue

Proceedings Volume 7140, 714011 (2008) https://doi.org/10.1117/12.804638

KEYWORDS: Data modeling, Line width roughness, Nanoimprint lithography, Critical dimension metrology, Lithography, Process modeling, Optical lithography, Lithographic illumination, Inspection, Semiconducting wafers

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Proceedings Article | 4 December 2008 Paper

Mask specification guidelines in spacer patterning technology

Kohji Hashimoto, Hidefumi Mukai, Seiro Miyoshi, Shinji Yamaguchi, Hiromitsu Mashita, Yuuji Kobayashi, Kenji Kawano, Takashi Hirano

Proceedings Volume 7140, 714022 (2008) https://doi.org/10.1117/12.804744

KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Line width roughness, Lithography, Opacity, Etching, Photoresist processing, Materials processing, Double patterning technology

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Proceedings Article | 19 May 2008 Paper

A study of mask specification in spacer patterning technology

Hidefumi Mukai, Yuuji Kobayashi, Shinji Yamaguchi, Kenji Kawano, Kohji Hashimoto

Proceedings Volume 7028, 702812 (2008) https://doi.org/10.1117/12.800464

KEYWORDS: Critical dimension metrology, Photomasks, Optical lithography, Surface plasmons, Lithography, Etching, Line width roughness, Double patterning technology, Semiconducting wafers, Photoresist processing

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Proceedings Article | 12 May 2005 Paper

Mid-range flare measurement and modeling

Kazuya Sato, Kenji Chiba, Kei Hayasaki, Kenji Kawano

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599605

KEYWORDS: Critical dimension metrology, Magnetorheological finishing, Photomasks, Point spread functions, Double patterning technology, Photoresist materials, Photoresist developing, Semiconducting wafers, Data modeling, Light scattering

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Proceedings Article | 12 May 2005 Paper

How to separate CD variation on local pattern density into error sources?

Kenji Kawano, Kazuya Sato, Kei Hayasaki, Kenji Chiba, Kohji Hashimoto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601114

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Semiconducting wafers, Double patterning technology, Dubnium, Reticles, Manufacturing, Error analysis, Process engineering

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Proceedings Article | 28 May 2004 Paper

A new process for accurate alignment using laser ablation technology

Hiroshi Ikegami, Kenji Kawano, Kazuhiko Ishigo, Tatsuhiko Higashiki, Nobuo Hayasaka, Naoto Yoshitaka, Hideaki Kashiwagi , Masayoshi Kobayashi, Yoichi Ogawa, Shinichi Ito

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534907

KEYWORDS: Aluminum, Laser irradiation, Laser ablation, Optical alignment, Semiconducting wafers, Thin films, Plasma, Metals, Tin, Laser applications

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Proceedings Article | 12 June 2003 Paper

Novel laser ablation patterning with organic thin film in running water

Shinichi Ito, Hiroshi Ikegami, Kenji Kawano, Tomoyuki Takeishi, Nobuo Hayasaka, Masayoshi Kobayashi, Tetsuya Hamamoto, Yoichi Ogawa, Naoto Yoshitaka, Shoichi Terada

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485045

KEYWORDS: Laser ablation, Particles, Photoresist processing, Optical lithography, Optical alignment, Video, Cameras, Thin films, Lithography, Natural surfaces

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Proceedings Article | 27 April 1999 Paper

High-accuracy development monitoring technology

Shinichi Ito, Kei Hayasaki, Kenji Kawano, Koutaro Sho, Shoji Mimotogi, Fumio Komatsu, Katsuya Okumura

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346907

KEYWORDS: Semiconducting wafers, Process control, Image processing, Critical dimension metrology, Process engineering, Control systems, Image analysis, Deep ultraviolet, CCD cameras, Microelectronics

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Proceedings Article | 24 July 1996 Paper

Subquarter-micron lithography with dual-trench-type alternating PSM

Hideki Kanai, Kenji Kawano, Satoshi Tanaka, Eishi Shiobara, Masami Aoki, Ikuo Yoneda, Shinichi Ito

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245213

KEYWORDS: Photomasks, Picosecond phenomena, Error analysis, Lithography, Phase shift keying, Phase shifts, Etching, Quartz, Opacity, Modulation

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Proceedings Article | 7 June 1996 Paper

Practical topography design for alternating phase-shifting mask

Satoshi Tanaka, Hiroko Nakamura, Kenji Kawano, Soichi Inoue

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240919

KEYWORDS: Photomasks, Phase shifts, Etching, Polarization, Maxwell's equations, Semiconducting wafers, Light scattering, Opacity, Structural design, Diffraction

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Proceedings Article | 3 July 1995 Paper

Lithographic performance of SiNx single-layer halftone mask

Kenji Kawano, Masafumi Asano, Satoshi Tanaka, Takayuki Iwamatsu, Hiroyuki Sato, Shinichi Ito

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212784

KEYWORDS: Transmittance, Halftones, Deep ultraviolet, Photomasks, Lithography, Phase shifts, Mercury, Lamps, Quartz, Silicon

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Showing 5 of 12 publications

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