Mr. Klaus Herold Profile

Klaus Herold

at Infineon Technologies North America Corp

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Author

Publications (9)

Proceedings Article | 16 March 2009 Paper

Etch aware optical proximity correction: a first step toward integrated pattern engineering

D. Dunn, S. Mansfield, I. Stobert, C. Sarma, G. Lembach, J. Liu, K. Herold

Proceedings Volume 7274, 727412 (2009) https://doi.org/10.1117/12.814224

KEYWORDS: Optical proximity correction, Etching, Lithography, Semiconducting wafers, Process modeling, Photoresist processing, Reactive ion etching, Critical dimension metrology, Calibration, Photomasks

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Proceedings Article | 16 March 2009 Paper

A new method for post-etch OPC modeling to compensate for underlayer effects from integrated wafers

Chandra Sarma, Amr Abdo, Derren Dunn, Daniel Fischer, Klaus Herold, Scott Mansfield, Len Tsou

Proceedings Volume 7274, 72740Z (2009) https://doi.org/10.1117/12.813546

KEYWORDS: Semiconducting wafers, Etching, Data modeling, Optical proximity correction, Instrument modeling, Critical dimension metrology, Photomasks, Data integration, Integrated modeling, Photoresist processing

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Proceedings Article | 17 October 2008 Paper

Single exposure is still alive: gate patterning at 45nm technology node

Klaus Herold, Donald Samuels, Derren Dunn, Amr Abdo, Chandrasekhar Sarma

Proceedings Volume 7122, 71220W (2008) https://doi.org/10.1117/12.801526

KEYWORDS: Optical proximity correction, Optical lithography, Etching, Double patterning technology, Process modeling, Photomasks, Semiconducting wafers, Computer simulations, Tolerancing, Manufacturing

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Proceedings Article | 2 April 2008 Paper

The comparison of OPC performance and run time for dense versus sparse solutions

Amr Abdo, Ian Stobert, Ramya Viswanathan, Ryan Burns, Klaus Herold, Chidam Kallingal, Jason Meiring, James Oberschmidt, Scott Mansfield

Proceedings Volume 6924, 69243G (2008) https://doi.org/10.1117/12.772902

KEYWORDS: Optical proximity correction, Data modeling, Scanning electron microscopy, Computer simulations, Calibration, Performance modeling, Resolution enhancement technologies, Semiconducting wafers, Lithography, Wafer-level optics

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Proceedings Article | 7 March 2008 Paper

Double exposure double etch for dense SRAM: a designer's dream

Chandra Sarma, Allen Gabor, Scott Halle, Henning Haffner, Klaus Herold, Len Tsou, Helen Wang, Haoren Zhuang

Proceedings Volume 6924, 692429 (2008) https://doi.org/10.1117/12.772985

KEYWORDS: Etching, Optical lithography, Double patterning technology, Tolerancing, Image processing, Photomasks, Lithography, Logic devices, Semiconducting wafers, Oxides

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Proceedings Article | 26 March 2007 Paper

Optimal SRAF placement for process window enhancement in 65-nm/45-nm technology

Chandra Sarma, Klaus Herold, Christoph Noelscher, Paul Schroeder

Proceedings Volume 6520, 65202B (2007) https://doi.org/10.1117/12.711480

KEYWORDS: SRAF, Photomasks, Tolerancing, Semiconducting wafers, Printing, Manufacturing, Lithography, Optical proximity correction, Logic, Standards development

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Proceedings Article | 20 October 2006 Paper

Managing high-accuracy and fast convergence in OPC

Klaus Herold, Norman Chen, Ian Stobert

Proceedings Volume 6349, 634924 (2006) https://doi.org/10.1117/12.686725

KEYWORDS: Optical proximity correction, Tolerancing, Semiconductors, Optical lithography, Data modeling, Process modeling, Photomasks, Silicon, Feature extraction, SRAF

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Proceedings Article | 15 March 2006 Paper

Finding the right way: DFM versus area efficiency for 65nm gate layer lithography

Chandra Sarma, Steven Scheer, Klaus Herold, Carlos Fonseca, Alan Thomas, Uwe Schroeder

Proceedings Volume 6154, 61541L (2006) https://doi.org/10.1117/12.656633

KEYWORDS: SRAF, Design for manufacturing, Lithography, Manufacturing, Tolerancing, Atrial fibrillation, Semiconducting wafers, Printing, Lithographic illumination, Optical proximity correction

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Proceedings Article | 28 May 2004 Paper

Calibration of OPC models for multiple focus conditions

Jochen Schacht, Klaus Herold, Rainer Zimmermann, J. Andres Torres, Wilhelm Maurer, Yuri Granik, Ching-Hsu Chang, G. Kuei-Chun Hung, Benjamin Szu-Min Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534123

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Photoresist processing, Image processing, Metrology, Thin films, Image acquisition, Error analysis

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Showing 5 of 9 publications

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