Ushio's LDP (Laser-assisted Discharge-produced Plasma) EUV source is a plasma EUV source utilizing rotating electrodes, circulating liquid tin, repetitive pulsed high-current discharge up to 10 kHz (15 kW), trigger lasers, and a debris filter to protect the optics from the tin debris emitted from the plasma [1]. The LDP EUV source can offer excellent light performance [2-3] for various applications in the semiconductor manufacturing ecosystems and has been used for Actinic Patterned Mask Inspection (APMI) [4] and beamline applications. Ushio is dedicated to continuous development, particularly performance, reliability and cost-of-ownership (CoO). Our research involved a series of experiments to measure the brightness, power, stability, and fast ions under various discharge conditions. We also implemented a more effective design to the debris filter. Data indicate that this modification will double the collector lifetime without compromising optical transmission. As a result of quality and robustness enhancements of the modules, the source MTBM has reached five weeks and is approaching six weeks in the field.
The Laser-assisted Discharge-produced Plasma (LDP) EUV source is a system to generate EUV from discharged plasma triggered by laser on one electrode disc which is coated by tin film. The source has been proven as a highly reliable light source in EUVL high volume production. Also, LDP EUV source enables to generate high brightness with relatively larger EUV plasma, which benefits space stability as well as relatively larger plasma power. In this session, the following items will be presented. (1) LDP EUV source configuration and operation sequence. (2) LDP EUV source key performance (3) Stability Improvement (4) Reliability improvement. (5) Sample exposure application
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.