Dr. Lander Verstraete Profile

Dr. Lander Verstraete

at imec

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Publications (8)

Proceedings Article | 9 April 2024 Presentation + Paper

Functional underlayers, surface priming, and multilayer stacks to improve dose and adhesion of EUV photoresists

Roberto Fallica, Lander Verstraete, Weizhong Huang, Mihir Gupta, Danilo De Simone, Si (Elly) Li, Daniel Sweat, Douglas Guerrero, Kodai Kato

Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

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Proceedings Article | 9 April 2024 Presentation + Paper

Material and process optimization for EUV pattern rectification by DSA

Lander Verstraete, Hyo Seon Suh, Julie Van Bel, Byeong-U Bak, Seong Eun Kim, Remi Vallat, Philippe Bezard, Matteo Beggiato, Christophe Beral

Proceedings Volume 12956, 129560G (2024) https://doi.org/10.1117/12.3010817

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Annealing, Bridges, Extreme ultraviolet lithography, Polymethylmethacrylate, Materials processing

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Proceedings Article | 5 October 2023 Paper

YOLOv8 for defect inspection of hexagonal directed self-assembly patterns: a data-centric approach

Enrique Dehaerne, Bappaditya Dey, Hossein Esfandiar, Lander Verstraete, Hyo Seon Suh, Sandip Halder, Stefan De Gendt

Proceedings Volume 12802, 128020S (2023) https://doi.org/10.1117/12.2675573

KEYWORDS: Data modeling, Directed self assembly, Performance modeling, Defect inspection, Scanning electron microscopy, Machine learning, Defect detection, Semiconductors, Inspection

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Proceedings Article | 1 May 2023 Presentation + Paper

EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study

Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Stefan De Gendt, Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson, YoungJun Her

Proceedings Volume 12497, 124970K (2023) https://doi.org/10.1117/12.2657990

KEYWORDS: Directed self assembly, Block copolymers, Extreme ultraviolet, Annealing, Film thickness, Extreme ultraviolet lithography, Line edge roughness, Critical dimension metrology, Semiconducting wafers, Line width roughness

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Proceedings Article | 1 May 2023 Presentation + Paper

Mitigating stochastics in EUV lithography by directed self-assembly

L. Verstraete, Hyo Seon Suh, Julie Van Bel, Purnota Hannan Timi, Remi Vallat, Philippe Bezard, Jelle Vandereyken, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Waikin Li, Mihir Gupta, Roberto Fallica

Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

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Proceedings Article | 30 April 2023 Poster

Track hardware as an EUV lithography booster: a deep-dive into SCREEN’s DT-3000 platform capabilities

Andreia Santos, Wesley Zanders, Elke Caron, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Jelle Vandereyken, Lander Verstraete, Hyo Seon Suh

Proceedings Volume 12498, 1249823 (2023) https://doi.org/10.1117/12.2658398

KEYWORDS: Extreme ultraviolet lithography, Lithography, Line width roughness, Ecosystems

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Proceedings Article | 31 October 2022 Poster

SCREEN's DT-3000 track-booster system: how can hardware improve EUV performance?

Andreia Santos, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Wesley Zanders, Jelle Vandereyken, Lander Verstraete, Ashish Rathore, Hyo Seon Suh

Proceedings Volume PC12292, PC122920W (2022) https://doi.org/10.1117/12.2643150

KEYWORDS: Extreme ultraviolet, Lithography, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Ecosystems

Proceedings Article | 7 June 2022 Presentation

Exploring the synergy between EUV lithography and directed self-assembly

Hyo Seon Suh, Lander Verstraete, Julie Van Bel, Philippe Bézard, Geert Mannaert, Jae Uk Lee, Shouhua Wang, Ivan Pollentier, Ashish Rathore

Proceedings Volume PC12054, PC1205402 (2022) https://doi.org/10.1117/12.2622565

KEYWORDS: Directed self assembly, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Semiconductors, Semiconducting wafers, Lithography, Light-matter interactions

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Showing 5 of 8 publications

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