Prof. LiHui Liu Profile

Prof. LiHui Liu

at Beijing Institute of Technology

SPIE Involvement:

Author

Publications (39)

Proceedings Article | 13 December 2021 Paper

Lithographic exposure latitude aware source and mask optimization

Lulu Zou, Lihui Liu, Yiyu Sun, Pengzhi Wei, Miao Yuan, Zhaoxuan Li, Yaning Li, Yanqiu Li

Proceedings Volume 12073, 1207302 (2021) https://doi.org/10.1117/12.2604844

KEYWORDS: Source mask optimization, Photomasks, Lithography, Resolution enhancement technologies, Semiconducting wafers, Lithium, Image processing, Electroluminescence, Optical proximity correction, Lithographic illumination

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Proceedings Article | 1 November 2021 Paper

Application of a revised scanning splice method for the Mueller microscope

Weinan Zhang, Lihui Liu, Guodong Zhou, Jiazhi Wang, Yuanhe Li, Yanqiu Li

Proceedings Volume 12057, 120573S (2021) https://doi.org/10.1117/12.2606678

KEYWORDS: Polarization, Microscopes, Image fusion

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Proceedings Article | 1 November 2021 Paper

Comparison of sparse-based full chip source optimization with different bases

Guanghui Liao, Lihui Liu, Yiyu Sun, Pengzhi Wei, Miao Yuan, Zhaoxuan Li, Yanqiu Li

Proceedings Volume 12057, 120570J (2021) https://doi.org/10.1117/12.2604075

KEYWORDS: Lithography, Resolution enhancement technologies, Optimization (mathematics), Optical lithography, Imaging systems

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Proceedings Article | 1 November 2021 Paper

Fast lithographic source pupil optimization using difference of convex functions algorithm for transformed L1 penalty

Yiyu Sun, Yanqiu Li, Guanghui Liao, Miao Yuan, Yang Liu, Yaning Li, Lulu Zou, Lihui Liu

Proceedings Volume 12057, 120570I (2021) https://doi.org/10.1117/12.2604052

KEYWORDS: Lithography, Optimization (mathematics), Algorithm development, Imaging systems, Zernike polynomials, Compressed sensing, Semiconducting wafers, Photomasks, Modulation, Lithium

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Proceedings Article | 27 October 2021 Paper

Quantitatively characterizing the microstructural features of collagen fiber bundles with or without tenocytes by Mueller imaging polarimeter

Chenle Cao, Jiazhi Wang, Guodong Zhou, Jianhui Li, Ke Liu, Lihui Liu, Li Li, Yanqiu Li

Proceedings Volume 11925, 119250Z (2021) https://doi.org/10.1117/12.2615692

KEYWORDS: Collagen, Tissues, Polarimetry, Polarization, Transplantation, Imaging systems, Structured optical fibers, Objectives, Lithium, Imaging technologies

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Proceedings Article | 5 November 2020 Paper

High-accuracy multi-step eigenvalue calibration method for Mueller matrix polarization imaging system

Jianhui Li, Yanqiu Li, Guodong Zhou, Jiazhi Wang, Meng Zheng, Ke Liu, Lihui Liu

Proceedings Volume 11567, 1156746 (2020) https://doi.org/10.1117/12.2580297

KEYWORDS: Calibration, Polarization, Imaging systems, Optical calibration, Mueller matrices, Polarimetry, Error analysis

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Proceedings Article | 12 December 2018 Paper

The defocused helical structure of two superposed vortex beams

Xuebing Dai, Yanqiu Li, Lihui Liu, Ye Wang, Jianhui Li, Guodong Zhou, Yanjun Chen

Proceedings Volume 10847, 108470Z (2018) https://doi.org/10.1117/12.2505676

KEYWORDS: Optical vortices, Superposition, Modulation, Diffraction

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Proceedings Article | 12 December 2018 Paper

Self-calibration and high-accuracy detection technology for the probability density of polarization state of a light field

Wenhao Pan, Jianhui Li, Tianlei Ning, Yanqiu Li, Ke Liu, Lihui Liu, Meng Zheng

Proceedings Volume 10847, 108470Y (2018) https://doi.org/10.1117/12.2505667

KEYWORDS: Polarization, Calibration, Point spread functions, Probability theory, Modulators, Optical components, Wave plates, Charge-coupled devices, Linear polarizers, Poincaré sphere

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Proceedings Article | 24 July 2018 Paper

Tolerance analysis of hyper numerical aperture lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li, Meng Zheng, Ke Liu, Lihui Liu

Proceedings Volume 10827, 108272C (2018) https://doi.org/10.1117/12.2501037

KEYWORDS: Tolerancing, Lithography, Wavefronts, Monochromatic aberrations, Image quality, Objectives, Distortion, Manufacturing, Error analysis, Assembly tolerances

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Proceedings Article | 24 July 2018 Paper

The intensity split of tightly focusing radial and azimuthal polarized vortex beam in longitudinal direction

Xuebing Dai, Yanqiu Li, Lihui Liu, Jianhui Li, Guodong Zhou, Yanjun Cheng, Ye Wang

Proceedings Volume 10827, 1082736 (2018) https://doi.org/10.1117/12.2501305

KEYWORDS: Spiral phase plates, Modulation, Super resolution, Beam shaping, Polarization, Diffraction, Optical vortices

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Proceedings Article | 12 January 2018 Paper

Quantitative analysis of wide field-of-view and broadband quarter-wave plate based on metasurface

Yanjun Chen, Zhe Guo, Ke Liu, Lihui Liu, Yanqiu Li

Proceedings Volume 10622, 106220G (2018) https://doi.org/10.1117/12.2295153

KEYWORDS: Polarization, Silver, Wave plates, Lithography, Visible radiation, Quantitative analysis, Finite-difference time-domain method

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SPIE Journal Paper | 21 November 2014 Open Access

Parametric source-mask-numerical aperture co-optimization for immersion lithography

Xuejia Guo, Yanqiu Li, Lisong Dong, Lihui Liu, Xu Ma, Chunying Han

JM3, Vol. 13, Issue 04, 043013, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043013

KEYWORDS: Photomasks, Source mask optimization, Artificial intelligence, Immersion lithography, Lithography, Optical fiber cables, Image processing, Binary data, Imaging systems, Resolution enhancement technologies

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Proceedings Article | 13 November 2014 Paper

Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Yue Jia, Yanqiu Li, Lihui Liu, Chunying Han, Xiaolin Liu

Proceedings Volume 9277, 92770Z (2014) https://doi.org/10.1117/12.2087529

KEYWORDS: Polarization, 3D acquisition, Immersion lithography, Critical dimension metrology, Cadmium, Lithographic illumination, Lithography, Error analysis, Projection systems, Image processing

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Proceedings Article | 21 August 2014 Paper

A method for compensating the polarization aberration of projection optics in immersion lithography

Yue Jia, Yanqiu Li, Lihui Liu, Chunying Han, Xiaolin Liu

Proceedings Volume 9283, 928309 (2014) https://doi.org/10.1117/12.2069711

KEYWORDS: Cadmium, Crystals, Polarization, Lithography, Protactinium, Projection systems, Birefringence, Immersion lithography, Critical dimension metrology, Lithographic illumination

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Proceedings Article | 31 March 2014 Paper

Efficient source polarization optimization for robust optical lithography

Xu Ma, Jie Gao, Chunying Han, Yanqiu Li, Lisong Dong, Lihui Liu

Proceedings Volume 9052, 90520T (2014) https://doi.org/10.1117/12.2045724

KEYWORDS: Polarization, Optimization (mathematics), Photomasks, Neptunium, Optical lithography, Computer simulations, Source mask optimization, Lithography, Imaging systems, Modulation

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SPIE Journal Paper | 18 March 2014 Open Access

Co-optimization of the mask, process, and lithography-tool parameters to extend the process window

Xuejia Guo, Yanqiu Li, Lisong Dong, Lihui Liu

JM3, Vol. 13, Issue 01, 013015, (March 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.013015

KEYWORDS: Photomasks, Source mask optimization, Lithography, Electroluminescence, Photoresist materials, Nanoimprint lithography, Metrology, Photoresist developing, Transmittance, Lithium

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Proceedings Article | 31 December 2013 Paper

A technique for extracting and analyzing the polarization aberration of hyper-numerical aperture image optics

Yanqiu Li, Xuejia Guo, Xiaolin Liu, Lihui Liu

Proceedings Volume 9042, 904204 (2013) https://doi.org/10.1117/12.2038176

KEYWORDS: Protactinium, Polarization, Optical coatings, Birefringence, Optical design, Lithography, Apodization, Analytical research, Silica, Geometrical optics

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Proceedings Article | 31 December 2013 Paper

Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography

Ouyang Chun, Yanqiu Li, Lihui Liu

Proceedings Volume 9042, 90421J (2013) https://doi.org/10.1117/12.2053896

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Optical systems, Reticles, Code division multiplexing, Extreme ultraviolet, Monte Carlo methods, Image quality

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Proceedings Article | 18 December 2012 Paper

Detailed illuminator design for full-field ArF lithography system with a method based on the fly's eye

Lidong Wei, Yanqiu Li, Lihui Liu

Proceedings Volume 8550, 855032 (2012) https://doi.org/10.1117/12.980911

KEYWORDS: Fiber optic illuminators, Eye, Lithography, Diffractive optical elements, Reticles, Zoom lenses, Relays, Lithographic illumination, Lens design, Axicons

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Proceedings Article | 15 October 2012 Paper

Simulation of Sub-wavelength 3D Photomask Induced Polarization Effect by RCWA

Liang Yang, Yanqiu Li, Lihui Liu, Jianfeng Wang

Proceedings Volume 8418, 841815 (2012) https://doi.org/10.1117/12.978258

KEYWORDS: Polarization, Photomasks, Diffraction, 3D modeling, Dielectric polarization, Diffraction gratings, Lithographic illumination, Binary data, Semiconducting wafers, Lithography

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Proceedings Article | 15 October 2012 Paper

Impact of MSD and mask manufacture errors on 45nm-node lithography

Chunying Han, Yanqiu Li, Lihui Liu, Xuejia Guo, Xuxia Wang, Jianhong Yang

Proceedings Volume 8418, 84180B (2012) https://doi.org/10.1117/12.978262

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Critical dimension metrology, Tolerancing, Manufacturing, Transmittance, Imaging systems, Phase shifts, Image processing

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Proceedings Article | 15 October 2012 Paper

Influence of flare and NA error on lithography

Xuxia Wang, Lihui Liu, Yanqiu Li, Xuejia Guo, Chunying Han, Jianhong Yang

Proceedings Volume 8418, 84180C (2012) https://doi.org/10.1117/12.978626

KEYWORDS: Lithography, Critical dimension metrology, Photomasks, Error analysis, Lithographic illumination, Phase shifts, Imaging systems, Light scattering, Reflection, Signal attenuation

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Proceedings Article | 15 October 2012 Paper

The Cross Talk of Multi-errors Impact on Lithography Performance and the Method of Its Control

Yanqiu Li, Chunying Han, Xuejia Guo, Lihui Liu, Xuxia Wang, Jianhong Yang

Proceedings Volume 8418, 841802 (2012) https://doi.org/10.1117/12.978295

KEYWORDS: Critical dimension metrology, Tolerancing, Lithography, Error analysis, Electroluminescence, Photomasks, Control systems, Process control, Manufacturing, Resolution enhancement technologies

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Proceedings Article | 3 February 2009 Paper

An LPG sensing system for leak detection of oil storage tanks

Lihui Liu, Qida Zhao, Luming Zhao, Yongtai He, Yanqiu Li

Proceedings Volume 7157, 715712 (2009) https://doi.org/10.1117/12.806981

KEYWORDS: Refractive index, Sensors, Liquids, Cladding, Temperature metrology, Sensing systems, Light sources, Environmental sensing, Diodes, Fiber Bragg gratings

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Proceedings Article | 12 January 2009 Paper

Solar micro-power system for self-powered wireless sensor nodes

Yongtai He, Yangqiu Li, Lihui Liu, Lei Wang

Proceedings Volume 7133, 71333Z (2009) https://doi.org/10.1117/12.810134

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Proceedings Article | 12 January 2009 Paper

Analysis of the optimal package diameter of FBG pressure sensor

Lihui Liu, Yongtai He, Fang Li, Yuliang Liu

Proceedings Volume 7133, 71331D (2009) https://doi.org/10.1117/12.821227

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Proceedings Article | 10 June 2006 Paper

Temperature-independent fiber Bragg grating micro-displacement sensor

Tuan Guo, Qida Zhao, Lifang Xue, Guiling Huang, Shiyu Gao, Yu Yan, Luming Zhao, Lihui Liu

Proceedings Volume 6344, 634433 (2006) https://doi.org/10.1117/12.694436

KEYWORDS: Fiber Bragg gratings, Sensors, Temperature metrology, Demodulation, Modulation, Reflection, Structural design, PIN photodiodes, Explosives, Infrared technology

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Proceedings Article | 6 December 2005 Paper

Temperature-independent fiber Bragg grating liquid-level sensor based on reflection optical power detection

Tuan Guo, Qida Zhao, Lifang Xue, Guiling Huang, Shiyu Gao, Yan Yu, Luming Zhao, Lihui Liu

Proceedings Volume 6019, 60191W (2005) https://doi.org/10.1117/12.637060

KEYWORDS: Fiber Bragg gratings, Liquids, Sensors, Temperature metrology, Reflection, Modulation, Light, Optical fibers, Spectrum analysis, Optical design

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Proceedings Article | 6 December 2005 Paper

Reconstructing arbitrary strain distributions within fiber gratings by evolutionary programming

Guiling Huang, Qida Zhao, Lihui Liu, Tuan Guo, Qinchang Tu, Shiyu Gao, Lifang Xue

Proceedings Volume 6019, 60191X (2005) https://doi.org/10.1117/12.635988

KEYWORDS: Fiber Bragg gratings, Computer programming, Reconstruction algorithms, Evolutionary algorithms, Computer simulations, Algorithm development, Inverse problems, Numerical simulations, Detection and tracking algorithms, Target detection

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Proceedings Article | 6 December 2005 Paper

FBG-type sensor for simultaneous measurement of temperature and force based on reflection spectrum broadening

Tuan Guo, Qida Zhao, Guiling Huang, Lifang Xue, Shiyu Gao, Yan Yu, Luming Zhao, Lihui Liu

Proceedings Volume 6019, 60191T (2005) https://doi.org/10.1117/12.636610

KEYWORDS: Fiber Bragg gratings, Temperature metrology, Reflection, Sensors, Optical fibers, Sun, Light, Spectrum analysis, Thermal effects, Aluminum

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Proceedings Article | 17 January 2005 Paper

Multichannel all-fiber acousto-optic modulator

Luming Zhao, Qida Zhao, Bangquan Liao, Lihui Liu

Proceedings Volume 5644, (2005) https://doi.org/10.1117/12.572212

KEYWORDS: Acoustics, Modulators, Acousto-optics, Bragg cells, Modulation, Transducers, Aluminum, Single mode fibers, Photodiodes, Spectrum analysis

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Proceedings Article | 17 January 2005 Paper

A study of normal and abnormal multifrequency acousto-optic device

Luming Zhao, Qida Zhao, Lihui Liu, Bangquan Liao

Proceedings Volume 5644, (2005) https://doi.org/10.1117/12.572208

KEYWORDS: Diffraction, Acousto-optics, Intermodulation, Acoustics, Modulation, Picosecond phenomena, Ultrasonics, Polarization, Refractive index, Medium wave

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