Ms. Ling Ee Tan Profile

Ling Ee Tan

Senior Engineer 2

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 23 November 2024 Paper

The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation

Ling Ee Tan, Fergo Treska, Werner Gillijns, Jeroen Van de Kerkhove, Peter De Bisschop, Vicky Philipsen, Ryoung-han Kim

Proceedings Volume 13216, 132161C (2024) https://doi.org/10.1117/12.3034348

KEYWORDS: Photomasks, Reflectivity, Semiconducting wafers, Printing, Design, Source mask optimization, Logic, Optical proximity correction, Nanoimprint lithography, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 28 April 2023 Poster + Paper

EUV SRAFs printing modeling and verification in 2D hole array

Ling Ee Tan, Chih-I Wei, Lianghoon Yin, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Farruh Shahidi, Shumay Shang, Germain Fenger, Le Hong, Werner Gillijns

Proceedings Volume 12494, 1249417 (2023) https://doi.org/10.1117/12.2658320

KEYWORDS: SRAF, Printing, Stochastic processes, Modeling, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Design and modelling, Data modeling, Photomasks

Read Abstract +

Proceedings Article | 28 April 2023 Presentation + Paper

Feasibility of logic metal scaling with 0.55NA EUV single patterning

Dongbo Xu, Ling Ee Tan, Vicky Philipsen, Joerg Zimmermann, Werner Gillijns

Proceedings Volume 12494, 124940M (2023) https://doi.org/10.1117/12.2657983

KEYWORDS: Source mask optimization, Metals, Extreme ultraviolet lithography, SRAF, Logic, Photomasks, Printing, Extreme ultraviolet

Read Abstract +

Proceedings Article | 28 April 2023 Paper

EUV single patterning of random logic via using bright field mask

Ling Ee Tan, Werner Gillijns, Jae Uk Lee, Dongbo Xu, Jeroen van de Kerkhove, Vicky Philipsen, Ryoung-han Kim

Proceedings Volume 12494, 124940X (2023) https://doi.org/10.1117/12.2658344

KEYWORDS: Source mask optimization, Reticles, Resolution enhancement technologies, Extreme ultraviolet lithography, SRAF, Logic, Semiconducting wafers, Design and modelling, Critical dimension metrology, Optical proximity correction, Printing

Read Abstract +

SPIE Journal Paper | 25 November 2022

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

Dongbo Xu, Werner Gillijns, Ling Ee Tan, David Rio, Max Delorme, Vicky Philipsen, Ryoung-han Kim

JM3, Vol. 21, Issue 04, 043202, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.043202

KEYWORDS: Photomasks, Design and modelling, Optical lithography, Metals, Binary data, SRAF, Critical dimension metrology, Extreme ultraviolet, Printing, Logic

Read Abstract +

Proceedings Article | 15 September 2022 Presentation

The EUV mask exposed

Vicky Philipsen, Devesh Thakare, Dongbo Xu, Ling Ee Tan, Jetske Stortelder, Mike Cooke, Andy Goodyear, Victor Soltwisch, Qais Saadeh, Sascha Brose, Andreas Erdmann

Proceedings Volume PC12325, PC123250B (2022) https://doi.org/10.1117/12.2641306

Read Abstract +

Proceedings Article | 26 May 2022 Presentation + Paper

Investigation of low-n mask in 0.33 NA EUV single patterning at pitch 28nm metal design

Dongbo Xu, Werner Gillijns, Ling Ee Tan, Vicky Philipsen, Ryoung-Han Kim

Proceedings Volume 12051, 120510H (2022) https://doi.org/10.1117/12.2614197

KEYWORDS: Photomasks, SRAF, Nanoimprint lithography, Metals, Extreme ultraviolet

Read Abstract +

Proceedings Article | 26 May 2022 Poster + Paper

EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm

Ling Ee Tan, Werner Gillijns, Jae Uk Lee, Dongbo Xu, Jeroen van de Kerkhove, Vicky Philipsen, Ryoung-Han Kim

Proceedings Volume 12051, 120510P (2022) https://doi.org/10.1117/12.2614000

KEYWORDS: Photomasks, Optical proximity correction, SRAF, Logic, Nanoimprint lithography, Source mask optimization, Photovoltaics, Printing, Lens design, Semiconducting wafers

Read Abstract +

SPIE Journal Paper | 7 April 2022

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Dongbo Xu, Werner Gillijns, Ling Ee Tan, Vicky Philipsen, Ryoung-Han Kim

JM3, Vol. 21, Issue 02, 024401, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024401

KEYWORDS: Photomasks, SRAF, Optical lithography, Nanoimprint lithography, Extreme ultraviolet, Molybdenum, Binary data, Metals, Source mask optimization, Personal protective equipment

Read Abstract +

Proceedings Article | 12 October 2021 Presentation + Paper

Exploration of alternative mask for 0.33NA EUV single patterning at pitch 28nm

Dongbo Xu, Werner Gillijns, Ling Ee Tan, Vicky Philipsen, Ryoung-han Kim

Proceedings Volume 11854, 118540T (2021) https://doi.org/10.1117/12.2599054

KEYWORDS: SRAF, Photomasks, Optical lithography, Source mask optimization, Extreme ultraviolet, Logic

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

EUV single patterning exploration for pitch 28 nm

Dongbo Xu, Werner Gillijns, Youssef Drissi, Ling Ee Tan, Apoorva Oak, Ryoung-han Kim

Proceedings Volume 11614, 116140Q (2021) https://doi.org/10.1117/12.2584730

KEYWORDS: Optical proximity correction, Semiconducting wafers, Metals, Extreme ultraviolet, SRAF, Lithography

Read Abstract +

Proceedings Article | 25 March 2020 Presentation

Concurrent design rule, OPC and process optimization in EUV Lithography (Conference Presentation)

Dongbo Xu, Werner Gillijns, Ling Ee Tan, Jae Uk Lee, Ryoung-Han Kim

Proceedings Volume 11328, 1132804 (2020) https://doi.org/10.1117/12.2553212

Read Abstract +

Proceedings Article | 4 April 2019 Paper

EUV computational lithography using accelerated topographic mask simulation

Vitaly Domnenko, Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Ryoung Ryoung Han Kim, Ling Ee Tan

Proceedings Volume 10962, 109620O (2019) https://doi.org/10.1117/12.2515668

KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Computational lithography, 3D modeling, Computer simulations, Optical proximity correction, Performance modeling, Photoresist processing, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 21 March 2018 Presentation + Paper

Single exposure EUV of 32nm pitch logic structures: patterning performance on BF and DF masks

V. Blanco Carballo, J. Bekaert, J. H. Franke, R. H. Kim, E. Hendrickx, L. E. Tan, W. Gillijns, Y. Drissi, M. Mao, G. McIntyre, M. Dusa, M. Kupers, D. Rio, G. Schiffelers, E. De Poortere, J. Jia, S. Hsu, M. Demand, K. Nafus, S. Biesemans

Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639

KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Read Abstract +

Proceedings Article | 20 March 2018 Presentation + Paper

IMEC N7, N5 and beyond: DTCO, STCO and EUV insertion strategy to maintain affordable scaling trend

Ryoung-han Kim, Yasser Sherazi, Peter Debacker, Praveen Raghavan, Julien Ryckaert, Arindam Malik, Diederik Verkest, Jae Uk Lee, Werner Gillijns, Ling Ee Tan, Victor Blanco, Kurt Ronse, Greg McIntyre

Proceedings Volume 10588, 105880N (2018) https://doi.org/10.1117/12.2299335

KEYWORDS: Optical lithography, Extreme ultraviolet, Metals, Logic, Manufacturing, Lithography, Back end of line, Extreme ultraviolet lithography, New and emerging technologies

Read Abstract +

Proceedings Article | 16 October 2017 Presentation

EUV single patterning for logic metal layers: achievement and challenge (Conference Presentation)

Ryoung-Han Kim, Werner Gillijns, Youssef Drissi, Jae Uk Lee, Darko Trivkovic, Victor Blanco Carballo, Stephane Larivière, Rudi De Ruyter, Morin Dehan, Gregory McIntyre, Ling Ee Tan

Proceedings Volume 10450, 1045004 (2017) https://doi.org/10.1117/12.2281738

KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Logic, Optical proximity correction, SRAF, Data conversion, Metals, Manufacturing, Semiconducting wafers

Read Abstract +

Proceedings Article | 26 April 2017 Presentation + Paper

Design and pitch scaling for affordable node transition and EUV insertion scenario

Ryoung-han Kim, Julien Ryckaert, Praveen Raghavan, Yasser Sherazi, Peter Debacker, Darko Trivkovic, Werner Gillijns, Ling Ee Tan, Youssef Drissi, Victor Blanco, Joost Bekaert, Ming Mao, Stephane Larivière, Greg McIntyre

Proceedings Volume 10148, 101480V (2017) https://doi.org/10.1117/12.2257885

KEYWORDS: Photomasks, Logic, Etching, SRAF, Extreme ultraviolet, Optical lithography, Metals, Computational lithography, Optical proximity correction, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 24 March 2017 Presentation + Paper

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

V. Blanco Carballo, J. Bekaert, M. Mao, B. Kutrzeba Kotowska, S. Larivière, I. Ciofi, R. Baert, R. H. Kim, E. Gallagher, E. Hendrickx, L. E. Tan, W. Gillijns, D. Trivkovic, P. Leray, S. Halder, M. Gallagher, F. Lazzarino, S. Paolillo, D. Wan, A. Mallik, Y. Sherazi, G. McIntyre, M. Dusa, P. Rusu, T. Hollink, T. Fliervoet, F. Wittebrood

Proceedings Volume 10143, 1014318 (2017) https://doi.org/10.1117/12.2258005

KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Back end of line, Extreme ultraviolet, Etching, Semiconducting wafers, Logic, Critical dimension metrology, Tin

Read Abstract +

Proceedings Article | 24 March 2017 Presentation + Paper

Reticle enhancement techniques toward iN7 metal2

W. Gillijns, L. E. Tan, Y. Drissi, V. Blanco, D. Trivkovic, R. H. Kim, E. Gallagher, G. McIntyre

Proceedings Volume 10143, 1014314 (2017) https://doi.org/10.1117/12.2258003

KEYWORDS: Metals, Extreme ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Reticles, Optical lithography, Calibration, Source mask optimization, Photomasks, SRAF, Semiconducting wafers

Read Abstract +

Showing 5 of 19 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years