We present a visible light interference lithography technique that utilizes a 2x2 cm metasurface mask to enable fabrication of 8x8 cm continuous and homogenous nano-architected materials. Patterns are resolved both in commercial 20-60 um films of SU-8 and >20 um films of custom glycidyl methacrylate-derived negative-tone photoresists. The combination of our metasurface-enabled large-scale 3D patterning technique with customizable photoresist chemistry provides a new pathway for scalable production of architected materials with nanometer feature resolution and advanced functional properties. Impact experiments using Laser-Induced Particle Impact Testing (LIPIT) were conducted to probe mechanical response and material homogeneity.
Nano-architected materials have the potential to be adopted in several areas including photonic devices and structural materials. We present a 3D interference lithography technique with dielectric metasurfaces at visible wavelengths that allows patterning of thick epoxide films over areas on the order of 10 cm^2 with 100 nm resolution. By leveraging the ability of the metasurface to control the amplitude and phase of a wavefront, complex near-field 3D interference patterns can be designed. Pyrolysis of 3D patterned SU-8 produces a carbon-based material with sub-100 nm features and enhanced mechanical properties.
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