Marco Guévremont
Sr Product Manager
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 12 October 2012 Paper
M. Rekow, T. Panarello, Nicolas Falletto, Marco Guevremont
Proceedings Volume 8473, 847303 (2012) https://doi.org/10.1117/12.935059
KEYWORDS: Pulsed laser operation, Solar cells, Laser drilling, Transparent conductors, Silicon, Laser processing, Optical lithography, Beam shaping, Laser ablation, Semiconducting wafers

Proceedings Article | 2 June 2003 Paper
David Herisson, DaniEle Neira, Cyril Fernand, Philippe Thony, Daniel Henry, Stephanie Kremer, Marco Polli, Marco Guevremont, Assim Elazami
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485031
KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Lithography, Scanning electron microscopy, Scatterometry, Metrology, Spectroscopic ellipsometry, Electron microscopes, Process control, Semiconducting wafers

Proceedings Article | 2 June 2003 Paper
Thomas Hingst, Thomas Marschner, Manfred Moert, Jan Homilius, Marco Guevremont, John Hopkins, Assim Elazami
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485011
KEYWORDS: Scatterometry, Semiconducting wafers, Single crystal X-ray diffraction, Photomasks, Critical dimension metrology, Process control, Scatter measurement, Scanning electron microscopy, Finite element methods, Spectroscopic ellipsometry

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473457
KEYWORDS: Scatterometry, Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Silicon, Metrology, Dielectrics, Reactive ion etching, Semiconducting wafers

Proceedings Article | 22 August 2001 Paper
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771
KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

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