Mr. Marco Mueller Profile

Marco Mueller

at ASML Netherlands BV

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Publications (1)

Proceedings Article | 27 April 2023 Presentation + Paper

EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274

KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

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