Marco Perske
Senior Engineer at optiX fab GmbH
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 30 April 2023 Presentation
Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Philipp Naujok, Klara Stallhofer, Tina Seifert, Annika Schmitt
Proceedings Volume PC12494, PC124940A (2023) https://doi.org/10.1117/12.2664589
KEYWORDS: Extreme ultraviolet, Multilayers, EUV optics, Semiconductors, Semiconducting wafers, Printing, Photons, Industry, Extreme ultraviolet lithography, Coating

Proceedings Article | 16 March 2015 Paper
Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Uwe Zeitner, Robert Leitel, Hans-Christoph Eckstein, Philipp Schleicher, Sven Schröder, Marcus Trost, Stefan Risse, Ralf Steinkopf, Frank Scholze, Christian Laubis
Proceedings Volume 9422, 94220E (2015) https://doi.org/10.1117/12.2175666
KEYWORDS: Extreme ultraviolet, Reflectivity, Mirrors, Optical filters, Binary data, Carbon dioxide lasers, Diffraction, Infrared radiation, Multilayers, Spherical lenses

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790C (2013) https://doi.org/10.1117/12.2015492
KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Optical coatings, Light sources, EUV optics, Tin

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 832217 (2012) https://doi.org/10.1117/12.919735
KEYWORDS: Mirrors, Extreme ultraviolet, Coating, Reflectivity, Multilayers, EUV optics, Light sources, Plasma, Extreme ultraviolet lithography, Light scattering

Proceedings Article | 25 September 2008 Paper
Proceedings Volume 7101, 71010Z (2008) https://doi.org/10.1117/12.796150
KEYWORDS: Multilayers, Reflectivity, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Interfaces, EUV optics, Carbon, Annealing, Thermography

Showing 5 of 6 publications
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