Ms. Marina V. Plat Profile

Marina V. Plat

at Lumeleds LLC

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 22 March 2007 Paper

Characterization of photo-acid redeposition in 193-nm photoresists

Thomas Wallow, Marina Plat, Zhanping Zhang, Brian MacDonald, Joffre Bernard, Jeremias Romero, Bruno La Fontaine, Harry Levinson

Proceedings Volume 6519, 65190T (2007) https://doi.org/10.1117/12.712338

KEYWORDS: Photoresist materials, Ions, Lithography, Image resolution, Chemical analysis, Bismuth, Photoresist processing, Photoresist developing, Raster graphics, Lead

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Proceedings Article | 12 May 2005 Paper

Design restrictions for patterning with off-axis illumination

Itty Matthew, Cyrus Tabery, Todd Lukanc, Marina Plat, Makoto Takahashi, Amada Wilkison

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606444

KEYWORDS: Cadmium sulfide, Optical lithography, Optical proximity correction, Diffraction, Transistors, Critical dimension metrology, Lithography, Photomasks, Resolution enhancement technologies, Lithographic illumination

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Proceedings Article | 14 September 2001 Paper

Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography

Marina Plat, Chris Spence, Christopher Lyons, Amada Wilkison

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435785

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Binary data, Monochromatic aberrations, Scanners, Optical proximity correction, Polymers, Etching

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Proceedings Article | 26 April 2001 Paper

ArF lithography: challenges, resolution capability, and the mask error enhancement function (MEEF)

Marina Plat, Christopher Lyons, Amada Wilkison, Jeff Schefske, Hung-Eil Kim

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425202

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Optical proximity correction, Monochromatic aberrations, Photoresist processing, Binary data, Back end of line, Printing, Polymers

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Proceedings Article | 21 July 2000 Paper

Manufacturability of the ultrathin resist process

Christopher Pike, Scott Bell, Marina Plat, Paul King, Khanh Nguyen, Christopher Lyons, Harry Levinson, Khoi Phan, Uzodinma Okoroanyanwu

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390068

KEYWORDS: Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Lithography, Etching, Manufacturing, Silicon, Inspection, Transistors, Photoresist materials

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Proceedings Article | 19 July 2000 Paper

Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Chris Spence, Marina Plat, Emile Sahouria, Nicolas Cobb, Franklin Schellenberg

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392102

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Semiconducting wafers, Phase shifts, Distortion, Binary data, Transistors, Visualization, Logic

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Proceedings Article | 5 July 2000 Paper

Impact of optical enhancement techniques on the mask error enhancement function (MEEF)

Marina Plat, Khanh Nguyen, Chris Spence, Christopher Lyons, Amada Wilkison

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389009

KEYWORDS: Photomasks, Binary data, Critical dimension metrology, Reticles, Image enhancement, Semiconducting wafers, Cadmium, Optical lithography, Image quality, Optical proximity correction

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Proceedings Article | 30 December 1999 Paper

Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

Chris Spence, Marina Plat, Emile Sahouria, Nicolas Cobb, Franklin Schellenberg

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373322

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Phase shifts, Semiconducting wafers, Distortion, Transistors, Binary data, Computer aided design, Data modeling

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Proceedings Article | 9 June 1995 Paper

Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation

Marina Plat, William Brunsvold, Randolph Smith, Nicholas Eib, Christopher Lyons

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210348

KEYWORDS: Critical dimension metrology, Absorbance, Reflectivity, Absorption, Photoresist processing, Picture Archiving and Communication System, Silicon, Performance modeling, Thin films, Dysprosium

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Proceedings Article | 9 June 1995 Paper

Shot-size reduction of photoresist formulations

Wayne Moreau, Kathleen Cornett, James Fahey, Leo Linehan, Warren Montgomery, Marina Plat, Randolph Smith, Robert Wood

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210363

KEYWORDS: Liquids, Semiconducting wafers, Coating, Photoresist materials, Polymers, Electroluminescence, Silicon, Solids, Thin film coatings, Photoresist processing

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Proceedings Article | 8 August 1993 Paper

TAR processing for CD control in I-line and 248-nm lithography

Christopher Lyons, Nicholas Eib, Marina Plat, Gary Spinillo, Kevin Welsh

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150471

KEYWORDS: Critical dimension metrology, Lithography, Reflectivity, Absorption, Photoresist processing, Semiconducting wafers, Image processing, Optical lithography, Process control, Photoresist materials

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Proceedings Article | 1 June 1992 Paper

Novel DNQ PACs for high-resolution i-line lithography

William Brunsvold, Nicholas Eib, Christopher Lyons, Steve Miura, Marina Plat, Ralph Dammel, O. Evans, M. Rahman, Dinesh Khanna, Sangya Jain, Ping-Hung Lu, Stanley Ficner

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59778

KEYWORDS: Lithography, Picture Archiving and Communication System, Photoresist materials, Standards development, Absorbance, Absorption, Ultraviolet radiation, Transparency, Optical spheres, Chromophores

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Showing 5 of 12 publications

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