Mr. Martin Bohn Profile

Martin Bohn

at Synopsys GmbH

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Author

Publications (3)

Proceedings Article | 12 November 2024 Presentation + Paper

Predictive printability assessment of EUV mask defects

Nicole Wu, Chun-Cheng Liao, Jirka Schatz, Thomas Muelders, Mariya Braylovska, John Tsai, Martin Bohn, Evgenii Sukhov, Wolfgang Demmerle

Proceedings Volume 13216, 1321611 (2024) https://doi.org/10.1117/12.3034491

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Contour extraction, Metrology, 3D mask effects, Printing, Lithography, Data modeling, Image processing, Calibration

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Proceedings Article | 22 February 2021 Presentation + Paper

Contour-based model calibration to a minimum number of patterns

Bernd Küchler, Francois Weisbuch, Wolfgang Hoppe, Jirka Schatz, Martin Bohn, Ulrich Klostermann

Proceedings Volume 11613, 116130G (2021) https://doi.org/10.1117/12.2584714

KEYWORDS: Calibration, Data modeling, Resolution enhancement technologies, Process modeling, Scanning electron microscopy, Data acquisition, Optical lithography, Metrology, Lithography, Computer simulations

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Proceedings Article | 4 April 2019 Paper

EUV computational lithography using accelerated topographic mask simulation

Vitaly Domnenko, Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Ryoung Ryoung Han Kim, Ling Ee Tan

Proceedings Volume 10962, 109620O (2019) https://doi.org/10.1117/12.2515668

KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Computational lithography, 3D modeling, Computer simulations, Optical proximity correction, Performance modeling, Photoresist processing, Resolution enhancement technologies

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