Mr. Martin F. Fay Profile

Martin F. Fay

Senior Scientist at Zygo Corporation

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Publications (6)

Proceedings Article | 28 October 2021 Presentation + Paper

Advances in flexible precision aspheric form measurement using axially scanned interferometry

Thomas Dresel, Karta Khalsa, Michael Turzhitsky, Martin Fay, Peter de Groot

Proceedings Volume 11889, 1188905 (2021) https://doi.org/10.1117/12.2602462

KEYWORDS: Aspheric lenses, Optical spheres, Calibration, Distortion, Interferometry, Metrology, Spherical lenses, Imaging systems, Precision measurement, Software development, Aspheric metrology

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SPIE Journal Paper | 22 May 2017 Open Access

Applications of model-based transparent surface films analysis using coherence-scanning interferometry

Martin Fay, Thomas Dresel

OE, Vol. 56, Issue 11, 111709, (May 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.11.111709

KEYWORDS: Model-based design, Interferometry, Metrology, Calibration, Refractive index, Oxides, Silicon, Silicon films, Gold, Systems modeling

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Proceedings Article | 28 August 2016 Paper

Applications of model-based transparent surface films analysis using coherence scanning interferometry

Martin Fay, Thomas Dresel

Proceedings Volume 9960, 996005 (2016) https://doi.org/10.1117/12.2238997

KEYWORDS: Oxides, Model-based design, Silicon, Metrology, Calibration, Gold, Interferometry, Reverse modeling, Refractive index, Zoom lenses

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Proceedings Article | 18 August 2014 Paper

Interferometric microscope with true color imaging

J. Beverage, X. Colonna de Lega, M. Fay

Proceedings Volume 9203, 92030S (2014) https://doi.org/10.1117/12.2063264

KEYWORDS: Sensors, Cameras, Metrology, Optical filters, Color imaging, Interferometry, Microscopes, Data acquisition, Light sources, Image resolution

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Proceedings Article | 24 March 2009 Paper

Multi-purpose optical profiler for characterization of materials, film stacks, and for absolute topography measurement

X. Colonna de Lega, Martin Fay, Peter de Groot, Boris Kamenev, J. Ryan Kruse, Mitch Haller, Mark Davidson, Lena Miloslavsky, Duncan Mills

Proceedings Volume 7272, 72723Z (2009) https://doi.org/10.1117/12.814629

KEYWORDS: Metrology, Data modeling, Oxides, Microscopes, Reflectivity, Semiconducting wafers, Optical properties, 3D metrology, Polarization, Data storage

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Showing 5 of 6 publications

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