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Dr. Martina Nardi
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Publications (1)
Proceedings Article | 5 March 2021 Presentation
Sensitive multi-photon photoresists: Overview and recent advances
Pascal Kiefer, Vincent Hahn, Martina Nardi, Liang Yang, Eva Blasco, Christopher Barner-Kowollik, Martin Wegener
Proceedings Volume 11677, 116770J (2021) https://doi.org/10.1117/12.2576304
KEYWORDS: Photoresist materials, Polymers, Printing, Photoresist developing, Oscillators, Materials science, Liquids, Laser systems engineering, Laser development, Laser damage threshold
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