CONFERENCE PROCEEDINGS
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Masamichi Kobayashi
Department Manager at Canon Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 7 March 2008 Paper
Immersion defect performance and particle control method for 45nm mass production
Takahito Chibana, Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Masayuki Tanabe, Hirohisa Oda
Proceedings Volume 6924, 69241B (2008) https://doi.org/10.1117/12.774672
KEYWORDS: Semiconducting wafers, Particles, Contamination, Inspection, Scanning probe microscopy, Bridges, Liquids, Water, Deep ultraviolet, Defect inspection
Proceedings Article | 7 March 2008 Paper
Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production
Keiji Yoshimura, Hitoshi Nakano, Hideo Hata, Nobuyoshi Deguchi, Masamichi Kobayashi, Takeaki Ebihara, Yoshio Kawanobe, Tsuneo Kanda
Proceedings Volume 6924, 69241O (2008) https://doi.org/10.1117/12.771876
KEYWORDS: Semiconducting wafers, Particles, Distortion, Liquids, Inspection, Bridges, Polarization, Thin film coatings, Scanning probe microscopy, Overlay metrology
Proceedings Article | 26 March 2007 Paper
Contamination and particle control system in immersion exposure tool
Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Masayuki Tanabe, Koji Toyoda, Takahito Chibana, Yoichi Matsuoka, Youji Kawasaki
Proceedings Volume 6520, 652014 (2007) https://doi.org/10.1117/12.711289
KEYWORDS: Particles, Contamination, Semiconducting wafers, Bridges, Defect inspection, Water, Inspection, Pulsed laser operation, Control systems, Transmittance
Proceedings Article | 11 April 2006 Paper
Analysis of 193nm immersion specific defects
Akihiko Otoguro, Jeung-Woo Lee, Toshiro Itani, Kiyoshi Fujii, Tomohiro Funakoshi, Tsunehiro Sakai, Kenji Watanabe, Mikio Arakawa, Hitoshi Nakano, Masamichi Kobayashi
Proceedings Volume 6153, 61531P (2006) https://doi.org/10.1117/12.656086
KEYWORDS: Photoresist processing, Bridges, Semiconducting wafers, Scanning electron microscopy, Photography, Immersion lithography, Thin film coatings, Lithography, Crystals, Quartz
Conference Committee Involvement (5)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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