Mr. Masato Hamatani Profile

Masato Hamatani

at Nikon Corp

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Author

Publications (10)

Proceedings Article | 10 March 2010 Paper

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

Hirotaka Kohno, Yuichi Shibazaki, Jun Ishikawa, Junichi Kosugi, Yasuhiro Iriuchijima, Masato Hamatani

Proceedings Volume 7640, 76401O (2010) https://doi.org/10.1117/12.846485

KEYWORDS: Semiconducting wafers, Double patterning technology, Optical alignment, Computer programming, Control systems, Eye, Scanners, Overlay metrology, Atrial fibrillation, Interferometers

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Proceedings Article | 11 December 2009 Paper

Latest results from the Nikon NSR-S620 double patterning immersion scanner

Kazuhiro Hirano, Yuichi Shibazaki, Masato Hamatani, Jun Ishikawa, Yasuhiro Iriuchijima

Proceedings Volume 7520, 75200Z (2009) https://doi.org/10.1117/12.837037

KEYWORDS: Semiconducting wafers, Optical alignment, Double patterning technology, Computer programming, Interferometers, Eye, Calibration, Overlay metrology, Manufacturing, Error analysis

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Proceedings Article | 16 March 2009 Paper

An innovative platform for high-throughput high-accuracy lithography using a single wafer stage

Yuichi Shibazaki, Hirotaka Kohno, Masato Hamatani

Proceedings Volume 7274, 72741I (2009) https://doi.org/10.1117/12.813386

KEYWORDS: Semiconducting wafers, Optical alignment, Computer programming, Interferometers, Calibration, Atrial fibrillation, Lithography, Double patterning technology, Overlay metrology, Metrology

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Proceedings Article | 21 March 2006 Paper

Mass production level ArF immersion exposure tool

Masahiko Okumura, Jun Ishikawa, Masato Hamatani, Masahiro Nei

Proceedings Volume 6154, 61541U (2006) https://doi.org/10.1117/12.656349

KEYWORDS: Semiconducting wafers, Calibration, Polarization, Imaging systems, Water, Lithography, Wavefronts, Projection systems, Resonance energy transfer, Scanners

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Proceedings Article | 15 March 2006 Paper

Effect of azimuthally polarized illumination imaging on device patterns beyond 45nm node

Ken Ozawa, Boontarika Thunnakart, Tokihisa Kaneguchi, Isao Mita, Atsushi Someya, Toshiharu Nakashima, Hisashi Nishinaga, Yasushi Mizuno, Tomoyuki Matsuyama, Masato Hamatani

Proceedings Volume 6154, 61540C (2006) https://doi.org/10.1117/12.656242

KEYWORDS: Lithographic illumination, Lithography, Line edge roughness, SRAF, Polarization, Photomasks, Imaging devices, Optical proximity correction, Manufacturing, Logic

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Proceedings Article | 12 May 2005 Paper

Progressive ArF exposure tool for 65nm node lithography

Nobuyuki Irie, Masato Hamatani, Masahiro Nei

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599564

KEYWORDS: Semiconducting wafers, Scanners, Lithography, Lithographic illumination, Reticles, Atrial fibrillation, Imaging systems, Polarization, Optical alignment, Distortion

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Proceedings Article | 28 May 2004 Paper

New advanced lithography tools with mix-and-match strategy

Jun Ishikawa, Masahiro Nei, Masato Hamatani, Shinji Wakamoto, Toshikazu Umatate

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537214

KEYWORDS: Lithography, Scanners, Distortion, Semiconducting wafers, Systems engineering, Reticles, Projection systems, Wavefront aberrations, Semiconductors, Wavefronts

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Proceedings Article | 2 June 2003 Paper

Portable phase measuring interferometer using Shack-Hartmann method

Toru Fujii, Jun Kougo, Yasushi Mizuno, Hiroshi Ooki, Masato Hamatani

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482699

KEYWORDS: Wavefronts, Charge-coupled devices, Wavefront sensors, Inspection, Calibration, Phase interferometry, Interferometers, Objectives, Reticles, Semiconducting wafers

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Proceedings Article | 30 July 2002 Paper

Self-calibration of wafer scanners using an aerial image sensor

Tsuneyuki Hagiwara, Masato Hamatani, Naoto Kondo, Kosuke Suzuki, Hisashi Nishinaga, Jiro Inoue, Koji Kaneko, Shunichi Higashibata

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474637

KEYWORDS: Calibration, Image sensors, Monochromatic aberrations, Scanners, Semiconducting wafers, Edge detection, Detection and tracking algorithms, Image acquisition, Distortion, Image processing

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Proceedings Article | 30 July 2002 Paper

Wafer edge-shot algorithm for wafer scanners

Tsuneyuki Hagiwara, Masato Hamatani, Hideyuki Tashiro, Etsuya Morita, Shinichi Okita, Naoto Kondo

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474628

KEYWORDS: Semiconducting wafers, Motion controllers, Sensors, Scanners, Sensing systems, Critical dimension metrology, Algorithm development, Image sensors, Switches, Optimization (mathematics)

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Showing 5 of 10 publications

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