This research introduces arrays of actionable microelectromechanical systems Fabry-Perot pixels designed for adaptive photolithography. To the authors' knowledge, this is the first demonstration of Fabry-Perot interferometry in the field of optical masks. Each individual pixel functions to either permit or block light transmission by utilizing constructive or destructive interferences facilitated by the Fabry-Perot effect. Through electrostatic actuation, the optical path is modified, primarily by modulating the air gap of the Fabry-Perot pixel. This adjustment yields a transmission contrast exceeding 35%, with the maximum and minimum transmission levels observed at 100% and 64%, respectively. The change in transmission correlates with a variation in the air gap by 140nm. These findings illustrate the fundamental principle behind a reprogrammable Fabry-Perot photomask, showcasing its ability to modulate the transmission of ultraviolet light essential in photolithography processes.
Digital lithography shortens development cycle time. Laser-based lithography is slow and lacks in overlay precision. The DIGITHO programmable photomask fits into standard photolithography steppers without system modifications. It can generate a different mask for each exposure. DIGITHO offers the most cost-effective solution for die-level serialization and fast prototyping to high throughput manufacturing.
Digital lithography shortens development cycle time. Laser-based lithography is slow and lacks in overlay precision. The DIGITHO programmable photomask fits into standard photolithography steppers without system modifications. It can generate a different mask for each exposure. DIGITHO offers the most cost-effective solution for die-level serialization and fast prototyping to high throughput manufacturing.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.