Dr. Nadya Belova Profile

Dr. Nadya Belova

Process Development and OPC Engineer at ON Semiconductor

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Publications (7)

Proceedings Article | 18 July 2013 Paper

Characterization and qualification of deep-submicron OTP poly-fuse memory

N. Belova, Derryl Allman, Stephen Tibbitts

Proceedings Volume 8700, 87000K (2013) https://doi.org/10.1117/12.2017548

KEYWORDS: Computer programming, Resistance, Cobalt, Reliability, Transistors, Resistors, Dielectrics, Head, Oxides, Statistical analysis

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Proceedings Article | 6 December 2004 Paper

Simple method for restricting OPC model minimum spacing and width for a no-failure imaging solution

Nadya Belova, Neal Callan

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569640

KEYWORDS: Optical proximity correction, Reticles, Scanning electron microscopy, Logic, Semiconducting wafers, Control systems, Photomasks, Fourier transforms, Metals, Prototyping

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Proceedings Article | 6 December 2004 Paper

Qualifying OPC model robustness to reticle noise errors and FAB process changes

Diane Keil, Nadya Belova, John Jensen, Neal Callan

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569580

KEYWORDS: Optical proximity correction, Reticles, Data modeling, Logic, Semiconducting wafers, Performance modeling, Lithography, Image processing, Tolerancing, Scanning electron microscopy

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Proceedings Article | 6 December 2004 Paper

Sensitivity of the 65-nm polyline printability to sPSM manufacturing errors

Nadya Belova, John Jensen, Ebo Croffie, Neal Callan

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570283

KEYWORDS: Reticles, Error analysis, Critical dimension metrology, Statistical analysis, Photomasks, Manufacturing, Monte Carlo methods, Semiconducting wafers, Computer simulations, Phase shifts

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Proceedings Article | 3 May 2004 Paper

Statistical analysis of poly line printability affected by sPSM manufacturing errors

Nadya Belova, John Jensen, Saied Khodabandeh, Ebo Croffie

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.556623

KEYWORDS: Error analysis, Photomasks, Critical dimension metrology, Statistical analysis, Manufacturing, Reticles, Phase shifts, Semiconducting wafers, Logic, Metrology

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Proceedings Article | 17 December 2003 Paper

OPC model generation procedure for different reticle vendors

Andrew Jost, Nadya Belova, Neal Callan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518219

KEYWORDS: Reticles, Optical proximity correction, Data modeling, Semiconducting wafers, Statistical modeling, Manufacturing, Quartz, Critical dimension metrology, Logic, Cadmium

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Proceedings Article | 17 December 2003 Paper

Multichip reticle approach for OPC model verification

Kunal Taravade, Nadya Belova, Andrew Jost, Neal Callan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518217

KEYWORDS: Optical proximity correction, Reticles, Semiconducting wafers, Logic, Metals, Inspection, Performance modeling, Photomasks, Manufacturing, Lithography

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Showing 5 of 7 publications

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