We have developed a system that measures total and angle resolved light scattering, reflectance and transmittance at 193 nm and 157 nm. This system allows the investigation of substrates and coatings for vacuum-ultraviolet (VUV) components with high sensitivity, down to scattering levels of 1 ppm for total scatter measurement. The dynamic range of the angle resolved scatter measurement set-up exceeds 9 orders of magnitude. Methods for evaluating the quality of CaF2 substrates for low loss optical components for 157 nm are presented. By using roughness data from Atomic Force Microscopy (AFM) measurements combined with scattering measurements surface roughness as well as inhomogeneities in the bulk of the material can be studied. Results are also presented of anti-reflective (AR) and highly reflective (HR) multiplayer coatings on CaF2.
Methods for evaluating the quality of CaF2 substrates for vacuum ultraviolet (VUV) low loss optical components are presented. Today superpolished CaF2 is available. However, major differences might still occur between batches and careful control is therefore necessary. By using roughness data from AFM measurements combined with total scattering measurements at 193 nm and 157 nm surface roughness as well as inhomogeneities in the bulk of the material can be studied. Results are also presented of anti-reflective (AR) and highly reflective (HR) multilayer coatings on CaF2 where reduced total backscatter scattering was found for the AR-coating as compared to the substrate.
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