By combining nanomasking with thermally resistant materials and sublimation in a molecular beam epitaxy reactor, porous (In)GaN layers can be obtained. The advantages and disadvantages of this technique compared to classical electrochemistry methods will be discussed. The porosity can be adjusted from 0 to 1 and the pore depth can be controlled by the sublimation temperature and time. Preferential sublimation occurs at the dislocation position which strongly enhance the photoluminescence properties. As the porosification process by sublimation does not depend on the doping, fully porous light emitting diodes can be demonstrated.
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