Dr. Oh-Sung Kwon Profile

Dr. Oh-Sung Kwon

at ASML Korea Co Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 20 March 2020 Presentation + Paper

Understanding advanced DRAM edge placement error budget and opportunities for control

Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon

Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

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Proceedings Article | 20 March 2020 Presentation + Paper

Taking the multi-wavelength DBO to the next level of accuracy and robustness

Jinsun Kim, Jeongijn Lee, Chan Hwang, Seung Yoon Lee, Wooyoung Jung, Joonsoo Park, Kaustuve Bhattacharyya, Arie den Boef, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Daniel Park, Kaustubh Padhye, Se-Ra Jeon, Seung-Bin Yang, Won-Jae Jang, Oh-Sung Kwon

Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676

KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

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Proceedings Article | 13 March 2018 Paper

Improved control of multi-layer overlay in advanced 8nm logic nodes

Tae-Sun Kim, Young-Sik Park, Yong-Chul Kim, Byoung-Hoon Kim, Ji-Hun Lee, Min-Keun Kwak, Sung-Won Choi, Joon-Soo Park, Hong-Cheon Yang, Philipp Meixner, Dong-jin Lee, Oh-Sung Kwon, Hyun-Su Kim, Jin-Tae Park, Sung-Min Lee, Cedric Grouwstra, Vidar van der Meijden, Mohamed El Kodadi, Chris Kim, Pierre-Yves Guittet, Tjitte Nooitgedagt

Proceedings Volume 10585, 1058527 (2018) https://doi.org/10.1117/12.2297099

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Overlay metrology, Logic, Metrology, Diffraction, Target acquisition, Performance modeling, Diffraction gratings

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Proceedings Article | 13 March 2018 Presentation + Paper

Scanner focus metrology and control system for advanced 10nm logic node

Junghun Oh, Kwang-Seok Maeng , Jae-Hyung Shin, Won-Woong Choi, Sung-Keun Won, Cedric Grouwstra, Mohamed El Kodadi, Stephan Heil, Vidar van der Meijden, Jong Kyun Hong , Sang-Jin Kim, Oh-Sung Kwon

Proceedings Volume 10585, 105851O (2018) https://doi.org/10.1117/12.2297442

KEYWORDS: Scanners, Semiconducting wafers, Metrology, Control systems, Interfaces, Logic, Critical dimension metrology, Lithography, High volume manufacturing, Environmental monitoring

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SPIE Journal Paper | 29 March 2016

High-order distortion control using a computational prediction method for device overlay

Young Seog Kang, Cedric Affentauschegg, Jan Mulkens, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, YoungSun Nam, Young-Sin Choi, Hunhwan Ha, Dong-Han Lee, Jae-il Lee, Umar Rizvi, Bernd Geh, Rob van der Heijden, Jan Baselmans, Oh-Sung Kwon

JM3, Vol. 15, Issue 02, 021403, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021403

KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

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Proceedings Article | 18 March 2015 Paper

Solution for high-order distortion on extreme illumination condition using computational prediction method

Young-Seog Kang, Hunhwan Ha, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, Young Sun Nam, Young-Sin Choi, Cedric Affentauschegg, Rob van der Heijden, Umar Rizvi, Bernd Geh, Eric Janda, Jan Baselmans, Stefan van der Sanden, Oh-Sung Kwon, Mariya Ponomarenko, Daan Slotboom

Proceedings Volume 9426, 942608 (2015) https://doi.org/10.1117/12.2086938

KEYWORDS: Overlay metrology, Distortion, Etching, Metrology, Image processing, Instrument modeling, Data modeling, Calibration, Photomasks, Measurement devices

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Showing 5 of 6 publications

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