Dr. Paolo Zambon Profile

Dr. Paolo Zambon

Scientist

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Author

Publications (5)

Proceedings Article | 26 June 2003 Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 11 March 2002 Paper

Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6-NA KrF imaging

Ivan Lalovic, Armen Kroyan, Paolo Zambon, Christopher Silsby, Nigel Farrar

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458263

KEYWORDS: Photoresist materials, Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Excimer lasers, Manufacturing, Optical proximity correction, Scanning electron microscopy, Reticles

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Proceedings Article | 14 September 2001 Paper

Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth

Ivan Lalovic, Armen Kroyan, Nigel Farrar, Dennis Taitano, Paolo Zambon, Adlai Smith

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435655

KEYWORDS: Monochromatic aberrations, Photoresist materials, Wavefronts, Lithography, Excimer lasers, Scanners, Diagnostics, Interferometers, Wavefront aberrations, Control systems

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Proceedings Article | 5 July 2000 Paper

Extending the performance of KrF laser for microlithography by using novel F2 control technology

Paolo Zambon, Mengxiong Gong, Jason Carlesi, Gunasiri Padmabandu, Mike Binder, Ken Swanson, Palash Das

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388984

KEYWORDS: Laser energy, Process engineering, Laser scanners, 3D scanning, Optical lithography, Lithography, Laser applications, Laser processing, Laser stabilization, Process control

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Proceedings Article | 26 July 1999 Paper

Production-ready 2-kHz KrF excimer laser for DUV lithography

Dave Myers, Tom Watson, Palash Das, Gunasiri Padmabandu, Paolo Zambon, Thomas Hofmann, William Partlo, Christopher Hysham, Richard Dunning

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354309

KEYWORDS: Lithography, Excimer lasers, Control systems, Reliability, Laser stabilization, Safety, Laser systems engineering, Deep ultraviolet, Manufacturing, Semiconductor lasers

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