Dr. Qi Zhang Profile

Dr. Qi Zhang

at Lawrence Berkeley National Lab.

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Author

Publications (5)

Proceedings Article | 12 November 2024 Presentation + Paper

Time-dependent characterization of total electron yield and outgassing in model EUV resist materials

Bernhard Lüttgenau, Meng Zhang, Qi Zhang, Cheng Wang, Ricardo Ruiz, Michael Connolly, Oleg Kostko

Proceedings Volume 13215, 132150H (2024) https://doi.org/10.1117/12.3034401

KEYWORDS: Outgassing, Extreme ultraviolet lithography, Extreme ultraviolet, Photoacid generators, Quenching, Photoresist materials, Chemical reactions, Ions, Thin films, Polymers

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SPIE Journal Paper | 18 October 2024 Open Access

Characterization of latent image of electron beam resist via critical-dimension resonant soft X-ray scattering

Qi Zhang, Kas Andrle, Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Alexander Hexemer, Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz, Cheng Wang

JM3, Vol. 23, Issue 04, 044003, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.044003

KEYWORDS: Scattering, X-rays, X-ray imaging, Stochastic processes, Atomic force microscopy, Extreme ultraviolet lithography, Electron beams, Simulations, Laser scattering, Finite element methods

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Proceedings Article | 10 April 2024 Poster

Incorporating iodine into polypeptoid chemically-amplified resists for improved EUV sensitivity

Cameron Adams, Chenyun Yuan, Qi Zhang, Oleg Kostko, Christopher Ober, Rachel Segalman

Proceedings Volume 12957, 1295724 (2024) https://doi.org/10.1117/12.3012454

KEYWORDS: Polymers, Metals, Halogens, Extreme ultraviolet, Chemically amplified resists, Stochastic processes, Photoresist materials, Optical lithography, Line edge roughness, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Presentation

Characterization of chemical/structural information of latent image via critical-dimension resonant soft x-ray scattering

Qi Zhang, Weilun Chao, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Ricardo Ruiz, Andrew Neureuther, Patrick Naulleau, Cheng Wang

Proceedings Volume 12955, 129550A (2024) https://doi.org/10.1117/12.3010967

KEYWORDS: Scattering, X-rays, X-ray imaging, X-ray characterization, Photoresist materials, X-ray sources, Data modeling, Light scattering, Laser scattering, Extreme ultraviolet lithography

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Proceedings Article | 22 November 2023 Poster

Metrology development on latent images via critical-dimension resonant soft x-ray scattering

Qi Zhang, Weilun Chao, Warren Holcomb, Ryan Miyakawa, Ricardo Ruiz, Dinesh Kumar, Andrew Neureuther, Patrick Naulleau, Cheng Wang

Proceedings Volume PC12750, PC1275012 (2023) https://doi.org/10.1117/12.2689943

KEYWORDS: Scattering, X-rays, X-ray imaging, Metrology, Systems modeling, X-ray sources, X-ray characterization, Time metrology, Spatial resolution, Simulations

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