Raphael Getin
IAPPS Engineer at KLA Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105852A (2018) https://doi.org/10.1117/12.2299976
KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Scanners, Process control, Modulation, Scatterometry, Finite element methods, Signal to noise ratio, Single crystal X-ray diffraction

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