Dr. Rian M. J. A. Rubingh Profile

Dr. Rian M. J. A. Rubingh

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 12 May 2005 Paper

Lithographic performance of a dual-stage 0.93NA ArF step and scan system

Rian Rubingh, Marco Moers, Manfred Suddendorf, Peter Vanoppen, Aernout Kisteman, Michael Thier, Vladan Blahnik, Eckhard Piper

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599805

KEYWORDS: Lithography, Monochromatic aberrations, Imaging systems, Sensors, Silver, Control systems, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

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SPIE Journal Paper | 1 January 2003

Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCAN AT:1100B system for 100 nm applications

Rian Rubingh, Youri van Dommelen, Sjef Tempelaars, Marc Boonman, Roger Irwin, Edwin van Donkelaar, Hans Burgers, Guustaaf Savenije, Bert Koek, Michael Thier, Oliver Roempp, Christian Hembd-Soellner

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1531190

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Reticles, Lithography, Monochromatic aberrations, Metrology, Imaging systems, Optical scanning systems, Distortion

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Proceedings Article | 30 July 2002 Paper

Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCAN AT:1100B system for 100-nm applications

Rian Rubingh, Youri van Dommelen, Sjef Tempelaars, Marc Boonman, Roger Irwin, Edwin van Donkelaar, Hans Burgers, Guustaaf Savenaije, Bert Koek, Michael Thier, Oliver Roempp, Christian Hembd-Soellner

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474619

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Sensors, Distortion, Scanning electron microscopy, Projection systems, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

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Proceedings Article | 14 September 2001 Paper

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Jan van Schoot, Nakgeuon Seong, Bernd Geh, Martin Burkhardt, Paul Graeupner, Gerd Reisinger, Rian Rubingh, Manfred Suddendorf, Jo Finders, Erwin Rikkers

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435723

KEYWORDS: Lithography, Monochromatic aberrations, Logic, Manufacturing, Wavefronts, Scanning electron microscopy, Printing, Zernike polynomials, Transistors, Resolution enhancement technologies

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