Mr. Robert Muller Profile

Robert Muller

at Broadcom Inc

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Author

Publications (4)

Proceedings Article | 24 May 2004 Paper

New methodology for evaluating and quantifying reticle line end shortening

Mark Simmons, John Jensen, Robert Muller, Andrew Jost

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533194

KEYWORDS: Metrology, Reticles, Time metrology, Algorithm development, Photomasks, Binary data, Precision measurement, Distance measurement, Standards development, Logic

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Proceedings Article | 17 December 2003 Paper

ART structures: a wafer targeting system that relaxes the mean-to-target reticle specification

Robert Muller, Mark Simmons, Duane Barber

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518159

KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Metrology, Photomasks, Tolerancing, Time metrology, Logic, Cadmium sulfide, Semiconductors

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Proceedings Article | 27 December 2002 Paper

Reticle defect management solutions for a wafer fab

Robert Muller, Glen Scheid, Neal Callan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467850

KEYWORDS: Reticles, Inspection, Logic, Semiconducting wafers, Photomasks, Defect inspection, Image classification, Classification systems, Silicon, Contamination

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Proceedings Article | 27 December 2002 Paper

Line edge roughness comparison between wet and dry etched reticles

Kunal Taravade, Robert Muller, Susan Erichsrud

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467246

KEYWORDS: Platinum, Reticles, Etching, Line edge roughness, Dry etching, Wet etching, Photomasks, Edge roughness, Manufacturing, Logic

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