Dr. Robert Seidel Profile

Dr. Robert Seidel

at Intel Corp

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Publications (4)

Proceedings Article | 10 April 2024 Presentation

DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification

Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Robert Seidel, Sandra Murcia, Lauren Doyle, Nityan Nair, Nafees Kabir, Sean Pursel, David Shykind, Todd Hoppe, Florian Gstrein

Proceedings Volume PC12956, PC129560P (2024) https://doi.org/10.1117/12.3012612

KEYWORDS: Directed self assembly, Extreme ultraviolet, Materials processing, Extreme ultraviolet lithography, Block copolymers, Surface roughness, Scanners, Optical lithography, Objectives, Fabrication

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Proceedings Article | 6 April 2015 Paper

The effects of geometry and chemistry of nanopatterned substrates on the directed self-assembly of block-copolymer melts

Grant Garner, Lance Williamson, Robert Seidel, Paulina Rincon Delgadillo, Su-Mi Hur, Roel Gronheid, Paul Nealey, Juan de Pablo

Proceedings Volume 9423, 94231K (2015) https://doi.org/10.1117/12.2085987

KEYWORDS: Polymers, Molecular self-assembly, Monte Carlo methods, Chemistry, Nanostructures, Computer simulations, Thermodynamics, Scanning electron microscopy, Optical lithography, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

The role of guide stripe chemistry in block copolymer directed self-assembly

Robert Seidel, Lance Williamson, YoungJun Her, Jihoon Kim, Guanyang Lin, Paul Nealey, Roel Gronheid

Proceedings Volume 9425, 94250W (2015) https://doi.org/10.1117/12.2085905

KEYWORDS: Chemistry, Tolerancing, Lithography, Semiconducting wafers, Line edge roughness, Thin films, Plasma etching, Etching, Polymethylmethacrylate, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assembly

Robert Seidel, Paulina Rincon Delgadillo, Abelardo Ramirez-Hernandez, Hengpeng Wu, Youngjun Her, Jian Yin, Paul Nealey, Juan de Pablo, Roel Gronheid

Proceedings Volume 9051, 90510K (2014) https://doi.org/10.1117/12.2048179

KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Etching, Scanning electron microscopy, Chemistry, Ions, Photoresist materials, Lithography, Neodymium, Directed self assembly

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