Hydrogen Depassivation Lithography has become established as the method for atomic-precision patterning for 2D dopant-based devices, such as qubits and analog quantum simulators. Research thus far in this area has mostly been focused on patterning of n-type dopants, such as P and As. In this work, we describe the process for fabrication of bipolar dopant-based devices, such as p-n junctions and n-p-n bipolar junction transistors, which may have a number of advantages such as improved gain-bandwidth product and low-noise operation. The P-doped parts of the device are created first, and the B-doped parts are created subsequently, requiring atomically-precise alignment to the P-doped parts. To achieve the necessary patterning precision, we have developed various advances to conventional STMs, including corrections for piezo creep and hysteresis, automatic lattice alignment, and spectroscopic imaging methods to give strong contrast of surface and buried dopants. The overall process described here has become known as Atomically Precise Advanced Manufacturing (APAM), which offers far better patterning precision than conventional techniques such as e-beam lithography.
KEYWORDS: Electron beam lithography, Manufacturing, Silicon, Chemical species, Scanning tunneling microscopy, Error control coding, Information technology, Fabrication, Lithography
Hydrogen Depassivation Lithography (HDL) is a version of electron beam lithography that uses scanning tunneling microscope (STM) instrumentation to expose a self–developing resist that is a monolayer of H chemisorbed to a Si (100) 2x1 H-passivated surface. Developed in the 1990s it has been largely a laboratory tool used in research for nanofabrication. The technique is capable of atomic resolution, the ability to remove single H atoms from the Si surface and has much higher precision than the best conventional e-beam lithography can possibly achieve exposing polymeric resists. However, its most promising attribute is that it can be used as a digital fabrication tool and is the first of a class of nanofabrication techniques that can be considered digital atomic scale fabrication technologies. Digital Atomic Scale Fabrication can be shown to have similar advantages over analog fabrication techniques that digital information technology has over analog information technology.
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