Mr. Rongbo Zhao Profile

Rongbo Zhao

at Institute of Microelectronics of the CAS

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Author

Publications (2)

Proceedings Article | 23 March 2020 Paper

Impact of flare on source mask optimization in EUVL for 7nm technology node

Lisong Dong, Rui Chen, Taian Fan, Rongbo Zhao, Yayi Wei, Jianjun Jia, Zac Levinson, Thuc Dam, Jay Lee, Yongdong Wang, Larry Melvin

Proceedings Volume 11323, 113232E (2020) https://doi.org/10.1117/12.2552008

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Lithography, Extreme ultraviolet, Electroluminescence, Reflectivity, Critical dimension metrology, Light scattering

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Proceedings Article | 26 September 2019 Paper

Impact of mask topography and flare on process window of EUV lithography

Rongbo Zhao, Lisong Dong, Rui Chen, Yayi Wei

Proceedings Volume 11147, 111471V (2019) https://doi.org/10.1117/12.2536871

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Lithographic illumination, Fiber optic illuminators, Numerical simulations, Deep ultraviolet, Absorption, Reflectivity, Surface roughness

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