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In this paper we discuss the technology of direct laser writing on metal films of the titanium group and chromium. It allows one to fabricate microstructures with a period of up to 1 μm at 0.7 μm spot size. Thermochemical effects of laser radiation on the films of various metals have been studied for a long time. The spatial resolution of thermochemical writing on metal films can be significantly improved by through oxidation, which dramatically increases negative feedback at light absorption. The study of laser writing on Zr and Ti films demonstrated their future promise for the technology of creating computer-generated holograms. However, the technology of laser through-oxidation is limited by relatively low scanning speeds of up to 500 mm/s. It limits CGH size when using circular scanning of the laser beam. Reactive ion etching of Ti films through the laser-induced oxide mask can be used to fabricate binary phase structures. The technology is studied for producing diffractive transmission spheres (TS) with an aperture of up to f/0.75.
In this paper, we propose a method for measuring the angular coordinate error of the circular laser writing systems based on laser interferometry. The method includes writing special test samples and their subsequent control using a conventional Fizeau interferometer. The angular coordinate error is calculated from the phase map. This method allows detecting errors of the angular coordinates up to 1-2 ang. sec. The test pattern can also be written on the same substrate within a single fabrication process with main pattern. This allows certification and quality control of the fabricated diffractive optical element. In addition, laser writing system can be periodically tested to verify that angular coordinate error is within acceptable limits. The method described in article can be extended to any writing system operating in the polar coordinate system.
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