Prof. Rémi Coquand
at CEA-LETI
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 10 April 2024 Poster
Ujwol Palanchoke, Florian Tomaso, Yorrick Exbrayat, Gaby Bélot, Marie-Line Pourteau, Ivanie Mendes, Juline Saugnier, Aurélien Fay, Sébastien Bérard-Bergery, Elodie Sungauer, Charlotte Beylier, Rémi Coquand, Arthur Bernadac
Proceedings Volume PC12956, PC129560Y (2024) https://doi.org/10.1117/12.3010850
KEYWORDS: 3D mask effects, Grayscale lithography, 3D modeling, Data modeling, 3D microstructuring, 3D acquisition, Semiconductors, Profilometers, Process control, Photoresist processing

Proceedings Article | 13 March 2024 Presentation
Proceedings Volume PC12889, PC128890C (2024) https://doi.org/10.1117/12.3001555
KEYWORDS: Silicon nitride, Quantum photonics, Thermography, Waveguides, Quantum sensing, Quantum computing, Physical vapor deposition, Photonic quantum computing, Optical sensing, Microwave radiation

Proceedings Article | 1 May 2023 Presentation + Paper
Ujwol Palanchoke, Gaby Bélot, Sébastien Bérard-Bergery, Juline Saugnier, Elodie Sungauer, Charlotte Beylier, Florian Tomaso, Marie-Line Pourteau, Ivanie Mendes, Rémi Coquand, Arthur Bernadac
Proceedings Volume 12497, 124970N (2023) https://doi.org/10.1117/12.2657600
KEYWORDS: Critical dimension metrology, 3D mask effects, Microlens, Design and modelling, Cadmium, Scanning electron microscopy, Semiconducting wafers, Error analysis, 3D acquisition, Grayscale lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Nacima Allouti, Pierre Chevalier, Sébastien Bérard-Bergery, Valérie Rousset, Benedicte Mortini, Patrick Quéméré, Florian Tomaso, Rémi Coquand
Proceedings Volume 10958, 1095809 (2019) https://doi.org/10.1117/12.2514712
KEYWORDS: Microlens, Photomasks, Grayscale lithography, Chromium, Lithography, Photoresist processing, Annealing, Oxygen, Optical lithography, Atomic force microscopy

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