Dr. Sanjay Malik Profile

Dr. Sanjay Malik

at FUJIFILM Electronic Materials USA Inc

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Author

Publications (9)

Proceedings Article | 12 June 2003 Paper

Novel materials for 157-nm bilayer resist designs

Stephanie Dilocker, Sanjay Malik, Binod De

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485207

KEYWORDS: Silicon, Absorbance, Etching, Polymers, Lithography, Silicon films, Semiconducting wafers, Transparency, Spectroscopy, Chemical species

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Proceedings Article | 12 June 2003 Paper

A HFIPS-based polymer approach for 157-nm single-layer photoresist

Shinichi Kanna, Kazuyoshi Mizutani, Shoichiro Yasunami, Yasumasa Kawabe, Shiro Tan, Morio Yagihara, Tadayoshi Kokubo, Sanjay Malik, Stephanie Dilocker

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485185

KEYWORDS: Polymers, Etching, Transparency, Resistance, Polymer thin films, Lithography, Fluorine, Chemical species, Absorption, Absorbance

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Resist materials for 157nm lithography is believed to be one of the key technology for producing patterns below 70nm. Many different types of fluorine-containing polymer platforms have been energetically pursued by a number of researchers, and some of them appear to be promising in giving a high transparency that has been the essential challenge in realizing this technology. While such highly transparent polymers are the premise in achieving a good imaging, how to get sufficient etch resistance of the polymers can be of another challenge. Actually it is often reported that the etch resistance and the transparency are in trade-off relationship in many cases as a function of fluorine atom content in the polymers. Therefore how to design an etch-resistant polymer while maintaining the good transparency is still a big challenge in developing a practically usable 157nm polymer platform. One of the polymer platforms that the authors believe useful for 157nm is the polymers having hexafluoroisopropanolstyrene (HFIPS) monomer unite in their backbones. The HFIPS unit is attractive because the styrene group provides good etch resistance and hexafluoroisopropanol group (HFIP) provides an acidic molecule while implementing a transparency into the molecule. The lithographic potential of the HFIPS-based polymer system was demonstrated with the fact that a prototype resist from this system was able to print a 75nm line and space 1:1 pairs with an attenuated PSM under 0.60NA stepper exposure. A relatively thin resist thickness, 100nm, was applied due to the limited transparency of the polymer. The patterned exhibited very smooth line edge and a clear pattern definition although a slight T-topping was observed. The results imply that we should be able to achieve a similar lithographic performance with a thicker film (150~200nm), if we can further increase the transparency of the HFIPS-based polymer. The authors are pursuing the approach further aiming at this direction and are getting several new polymers that are more transparent. The paper will present some of the results from later work with such an attempt. The paper will also discuss etch resistance of the HFIPS-based polymer. The etch rates measured for the HFIPS-based polymers were only around 10% faster than standard 248nm resist, which we believe fairly good among various fluorine-containing polymers so far proposed. This was convincing that this polymer system could provide a competitive platform in the practical use. It is generally thought that the etch rate of resist films are mainly affected by their polymer compositions or structures but there are few reported on the influence of the other components in resist formulation. The authors found that the concentration of PAG and quencher influenced both etch rate and resist surface roughness after the etch in this materials system, which implied there are some more room for further etch resistance improvement.

Proceedings Article | 23 June 2000 Paper

Structural design of a new class of acetal polymer for DUV resists

Toru Fujimori, Shiro Tan, Toshiaki Aoai, Fumiyuki Nishiyama, Tsukasa Yamanaka, Makoto Momota, Shinichi Kanna, Yasumasa Kawabe, Morio Yagihara, Tadayoshi Kokubo, Sanjay Malik, Lawrence Ferreira

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388342

KEYWORDS: Polymers, Lithography, Etching, Dry etching, Resistance, Deep ultraviolet, Silicon films, Structural design, Polymer thin films, Photoresist materials

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Proceedings Article | 11 June 1999 Paper

Lithographic properties of novel acetal-derivatized hydroxy styrene polymers

Sanjay Malik, Andrew Blakeney, Lawrence Ferreira, Brian Maxwell, Allyn Whewell, Thomas Sarubbi, Murrae Bowden, Veerle Van Driessche, Toru Fujimori, Shiro Tan, Toshiaki Aoai, Kazuya Uenishi, Yasumasa Kawabe, Tadayoshi Kokubo

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350222

KEYWORDS: Polymers, Lithography, Etching, Plasma etching, Resistance, Plasma, Photomasks, Printing, Critical dimension metrology, Chemistry

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Proceedings Article | 11 June 1999 Paper

Resist outgassing as a function of differing photoadditives

Francis Houlihan, Ilya Rushkin, Richard Hutton, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis, Allen Gabor, Arturo Medina, Sanjay Malik, M. Neiser, Roderick Kunz, Deanna Downs

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350209

KEYWORDS: Lithography, Chromophores, Photolysis, NOx, Polymers, Diffusion, Quartz, Electron beam lithography, Deep ultraviolet, Ultraviolet radiation

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Proceedings Article | 11 June 1999 Paper

Optimizing a DUV positive resist for metal layers

Sanjay Malik, Brian Maxwell, Anna Gandolfi, Alberto Ornaghi, Allyn Whewell, Kenneth Uhnak, Stefano Volpi, Veerle Van Driessche, Thomas Sarubbi, Steven Hansen, Murrae Bowden

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350235

KEYWORDS: Metals, Polymers, Tin, Etching, Lithography, Resistance, Deep ultraviolet, Reflectivity, Diffusion, Resolution enhancement technologies

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Proceedings Article | 29 June 1998 Paper

Structural basis for high thermal stability of a resist

Sanjay Malik, Andrew Blakeney, Lawrence Ferreira, Medhat Toukhy, John Ferri

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312478

KEYWORDS: Hydrogen, Polymers, Lithography, Photoresist materials, Spectroscopy, Picture Archiving and Communication System, Carbon, Temperature metrology, Semiconducting wafers, Silicon

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Proceedings Article | 29 June 1998 Paper

Chemically amplified resist technology for i-line applications

Medhat Toukhy, Sanjay Malik, Andrew Blakeney, Karin Schlicht

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312371

KEYWORDS: Deep ultraviolet, Chemistry, Resist chemistry, Chemically amplified resists, Lithography, Scanners, Polymers, Diffusion, Photoresist processing, Picture Archiving and Communication System

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Proceedings Article | 29 June 1998 Paper

Choice of amines as stabilizers for chemically amplified resist systems

Lawrence Ferreira, Sanjay Malik, Thomas Sarubbi, Andrew Blakeney, Brian Maxwell

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312413

KEYWORDS: Polymers, Chemically amplified resists, Lithography, Chemical analysis, Systems modeling, Solids, Data modeling, Diffusion, Photoresist processing, Picosecond phenomena

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Showing 5 of 9 publications

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