Dr. SehJin Park Profile

Dr. SehJin Park

at Intel Corp

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Author

Publications (9)

Proceedings Article | 9 September 2013 Paper

Direct phase-shift measurement of an EUV mask with gradient absorber thickness

Hiroyoshi Tanabe, Tetsunori Murachi, Seh-Jin Park, Eric Gullikson, Tsukasa Abe, Naoya Hayashi

Proceedings Volume 8880, 88801D (2013) https://doi.org/10.1117/12.2031135

KEYWORDS: Extreme ultraviolet, Phase measurement, Photomasks, Reflectivity, Phase shifts, Scattering, Data modeling, Reflectometry, Light scattering, Sensors

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Proceedings Article | 14 October 2011 Paper

Phase-shifting effect of thin-absorber EUV masks

Hiroyoshi Tanabe, Tetsunori Murachi, Sang H. Lee, Manish Chandhok, Seh-Jin Park, Guojing Zhang, Tsukasa Abe, Taichi Ogase, Naoya Hayashi

Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

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Proceedings Article | 11 May 2009 Paper

Improvement of EUVL mask blank inspection capability at Intel

Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose

Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259

KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

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Proceedings Article | 18 March 2009 Paper

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan Myers, Michael Leeson, Marilyn Kamna, Fabian Martinez, Alan Stivers, Gian Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen

Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428

KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

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Proceedings Article | 17 October 2008 Paper

Pattern placement correction due to bending in EUVL masks

Seh-Jin Park, Chandhok Manish, Marilyn Kamna, Chuan Hu, Guojing Zhang, Fabian Martinez, Nathan Wilcox, Kamgmin Hsia, Alan Stivers

Proceedings Volume 7122, 71222C (2008) https://doi.org/10.1117/12.801542

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

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Proceedings Article | 29 May 2007 Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 20 May 2006 Paper

EUV mask process development and integration

Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric Lanzendorf, Chang Ju Choi, Emily Shu, Alan Stivers, Jeff Farnsworth, Kangmin Hsia, Manish Chandhok, Michael Leeson, Gilroy Vandentop

Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

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Proceedings Article | 20 May 2006 Paper

TaN-based EUV mask absorber etch study

Yan Du, Chang Ju Choi, Guojing Zhang, Seh-Jin Park, Pei-Yang Yan, Ki-Ho Baik

Proceedings Volume 6283, 62833D (2006) https://doi.org/10.1117/12.681832

KEYWORDS: Etching, Chemistry, Photomasks, Ruthenium, Extreme ultraviolet, Reactive ion etching, Critical dimension metrology, Chlorine, Diffractive optical elements, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2006 Paper

EUV mask pattern defect printability

Ted Liang, Guojing Zhang, Patrick Naulleau, Alan Myers, Seh-Jin Park, Alan Stivers, Gilroy Vandentop

Proceedings Volume 6283, 62830K (2006) https://doi.org/10.1117/12.681844

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Cadmium, Photomicroscopy, Semiconducting wafers, Optical lithography

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Showing 5 of 9 publications

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