Shanshan Mao
at Beijing Institute of Technology
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 July 2018 Paper
Proceedings Volume 10827, 108272C (2018) https://doi.org/10.1117/12.2501037
KEYWORDS: Tolerancing, Lithography, Wavefronts, Monochromatic aberrations, Image quality, Objectives, Distortion, Manufacturing, Error analysis, Assembly tolerances

SPIE Journal Paper | 11 February 2017
OE, Vol. 56, Issue 02, 025102, (February 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.2.025102
KEYWORDS: Objectives, Deep ultraviolet, Lithography, Combined lens-mirror systems, Mirrors, Lens design, Lithium, Optical engineering, Optical design, Refractor telescopes

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